- 专利标题： Selection method for additives in photopolymers
-
申请号： US14693999申请日： 2015-04-23
-
公开(公告)号： US10514657B2公开(公告)日： 2019-12-24
- 发明人: Thomas Roelle , Friedrich-Karl Bruder , Thomas Fäcke , Marc-Stephan Weiser , Dennis Hönel , Christian Diedrich
- 申请人： Bayer MaterialScience AG
- 申请人地址： DE Leverkusen
- 专利权人： Covestro Deutschland AG
- 当前专利权人： Covestro Deutschland AG
- 当前专利权人地址： DE Leverkusen
- 代理机构： Drinker Biddle & Reath LLP
- 优先权： EP09013764 20091103
- 主分类号： G16C10/00
- IPC分类号： G16C10/00 ; G16C20/30 ; G03F7/00 ; G03F7/004 ; G06F7/548 ; G03F7/035 ; G03H1/02 ; G11B7/24044 ; G11B7/245 ; G03H1/04 ; G11B7/0065
摘要：
The invention relates to a method for selecting compounds which can be used as additives in photopolymer formulations for producing light holographic media, and to photopolymer formulations which contain at least one softener which are selected according to the claimed method. The invention also relates to the use of photopolymer formulations for producing holographic media.
公开/授权文献
- US20160231705A9 SELECTION METHOD FOR ADDITIVES IN PHOTOPOLYMERS 公开/授权日：2016-08-11
信息查询
