- 专利标题: X-ray apparatus and structure production method
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申请号: US15502120申请日: 2014-08-07
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公开(公告)号: US10533958B2公开(公告)日: 2020-01-14
- 发明人: Toshihisa Tanaka , Shinsuke Takeda , Naoshi Sakaguchi
- 申请人: NIKON CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 国际申请: PCT/JP2014/070941 WO 20140807
- 国际公布: WO2016/021030 WO 20160211
- 主分类号: G01N23/04
- IPC分类号: G01N23/04 ; G01N23/046 ; G01N23/083
摘要:
An X-ray apparatus includes: a mounting unit upon which an object to be measured is mounted; an X-ray generation unit that irradiates X-rays, from above the mounting unit or from below the mounting unit, to the object to be measured upon the mounting unit; an X-ray detector that acquires a transmission image of the object to be measured being irradiated by the X-rays; a first movement unit that moves at least one of the mounting unit, the X-ray generation unit, and the X-ray detector along a direction of irradiation of the X-rays; a position detection unit that detects a relative position of the mounting unit, the X-ray generation unit, and the X-ray detector; and a calculation unit that calculates a magnification of a transmission image of the object to be measured acquired by the X-ray detector, in a state in which deflection of the mounting unit has occurred while the object to be measured is mounted upon the mounting unit.
公开/授权文献
- US10571412B2 X-ray apparatus and structure production method 公开/授权日:2020-02-25
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