- 专利标题: Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition
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申请号: US15824360申请日: 2017-11-28
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公开(公告)号: US10538627B2公开(公告)日: 2020-01-21
- 发明人: Takeshi Kawabata , Takuma Amemiya , Hidekazu Oohashi , Yu Iwai , Akinori Shibuya
- 申请人: FUJIFILM Corporation
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2015-109653 20150529; JP2015-160682 20150817
- 主分类号: C08G73/10
- IPC分类号: C08G73/10 ; G03F7/021 ; G03F7/023 ; G03F7/038 ; H01L23/29 ; H01L23/31 ; H01L25/065 ; H01L25/07 ; H01L25/18 ; C08F290/14 ; G03F7/031 ; G03F7/037 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/40 ; H01L23/00
摘要:
A photosensitive resin composition using a polyimide precursor composition, a cured film, a method for producing a cured film, a semiconductor device, and a method for producing a polyimide precursor composition are provided. In the polyimide precursor composition, the molar ratio of repeating units represented by General Formula (1-2) among structural isomers of the polyimide precursor is 60% to 90% by mole. In General Formula (1-2), A1 and A2 each independently represents an oxygen atom or NH, R111 and R112 each independently represents a single bond or a divalent organic group, and R113 and R114 each independently represents a hydrogen atom or a monovalent organic group.
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