- Patent Title: Distortion measurement method for electron microscope image, electron microscope, distortion measurement specimen, and method of manufacturing distortion measurement specimen
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Application No.: US15989459Application Date: 2018-05-25
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Publication No.: US10541111B2Publication Date: 2020-01-21
- Inventor: Yuji Konyuba , Kazuya Omoto , Hidetaka Sawada
- Applicant: JEOL Ltd.
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2017-105056 20170526
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/26 ; G01N1/32
Abstract:
A distortion measurement method for an electron microscope image includes: loading a distortion measurement specimen having structures arranged in a lattice to a specimen plane of an electron microscope or a plane conjugate to the specimen plane in order to obtain an electron microscope image of the distortion measurement specimen; and measuring a distortion from the obtained electron microscope image of the distortion measurement specimen.
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