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公开(公告)号：US20220214250A1
公开(公告)日：2022-07-07
申请号：US17550002
申请日：2021-12-14
Applicant: JEOL Ltd.
Inventor： Yuji Konyuba , Tomohiro Haruta , Yuta Ikeda , Tomohisa Fukuda
IPC: G01N1/28
Abstract: A specimen pretreatment method for transferring a specimen supported by a first specimen supporting tool to a second specimen supporting tool, the specimen pretreatment method including: transferring a specimen supported by the first specimen supporting tool to a film; immersing the film and the specimen on the film in a liquid to dissolve the film; and recovering the specimen from the liquid and supporting the specimen with the second specimen supporting tool.
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公开(公告)号：US20220018742A1
公开(公告)日：2022-01-20
申请号：US17378914
申请日：2021-07-19
Applicant: JEOL Ltd.
Inventor： Yuji Konyuba , Tomohiro Haruta , Tomohisa Fukuda , Yuta Ikeda , Yusuke Toriumi
Abstract: A specimen support tool for supporting a slice prepared by using a microtome includes a specimen support member on which a groove for guiding the slice is formed.
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公开(公告)号：US11037755B2
公开(公告)日：2021-06-15
申请号：US16410243
申请日：2019-05-13
Applicant: JEOL Ltd.
Inventor： Yuji Konyuba , Yuta Ikeda , Tomohiro Haruta , Tomohisa Fukuda
IPC: H01J37/20 , H01J37/28 , H01J37/244
Abstract: An observation method includes placing a specimen on a specimen supporting film of a specimen support, attaching the specimen support to a retainer, attaching the retainer to an optical microscope retainer holding base, attaching the optical microscope retainer holding base to a specimen stage of an optical microscope and observing the specimen under the optical microscope, attaching the retainer to a transmission electron microscope retainer holding base, and loading the transmission electron microscope retainer holding base into a transmission electron microscope and observing the specimen under the transmission electron microscope.
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公开(公告)号：US09613780B2
公开(公告)日：2017-04-04
申请号：US14657059
申请日：2015-03-13
Applicant: JEOL Ltd.
Inventor： Yuji Konyuba
CPC classification number: H01J37/20 , C23C14/14 , H01J2237/20
Abstract: A method of fabricating a sample support membrane used to support an electron microscope sample starts with forming a first layer on a first layer of a substrate (S100). A second surface of the substrate that faces away from the first surface is etched to form an opening that exposes the first layer (S102). A second layer is formed on the first layer (S104). The region of the first layer that overlaps the opening as viewed within a plane is removed to expose the second layer (S106).
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公开(公告)号：US20150259785A1
公开(公告)日：2015-09-17
申请号：US14657059
申请日：2015-03-13
Applicant: JEOL Ltd.
Inventor： Yuji Konyuba
CPC classification number: H01J37/20 , C23C14/14 , H01J2237/20
Abstract: A method of fabricating a sample support membrane used to support an electron microscope sample starts with forming a first layer on a first layer of a substrate (S100). A second surface of the substrate that faces away from the first surface is etched to form an opening that exposes the first layer (S102). A second layer is formed on the first layer (S104). The region of the first layer that overlaps the opening as viewed within a plane is removed to expose the second layer (S106).
Abstract translation: 用于支撑电子显微镜样品的样品支撑膜的制造方法开始于在基板的第一层上形成第一层（S100）。 蚀刻基板的远离第一表面的第二表面以形成暴露第一层的开口（S102）。 在第一层上形成第二层（S104）。 去除与在平面内观察的开口重叠的第一层的区域以露出第二层（S106）。
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Patent Agency Ranking
公开(公告)号：US20140183358A1
公开(公告)日：2014-07-03
申请号：US14138717
申请日：2013-12-23
Applicant: JEOL Ltd.
Inventor： Hirofumi Iijima , Yuji Konyuba
CPC classification number: G03F7/001 , H01J37/02 , H01J37/04 , H01J37/26 , H01J2237/2614
Abstract: A method of fabricating a phase plate, for use in a transmission electron microscope, with simple process steps is offered. The method includes a step (S100) of forming a first layer on a substrate, a step (S102) of patterning the first layer to form through-holes extending through the first layer, a step (S104) of etching the surface of the substrate opposite to the surface on which the first layer is formed to form an opening which is in communication with the through-holes and which exposes the first layer, and a step (S106) of forming a second layer on the first layer.
Abstract translation: 提供了一种以简单的工艺步骤制造用于透射电子显微镜的相位板的方法。 该方法包括在基板上形成第一层的工序（S100），对第一层进行图案化以形成延伸穿过第一层的贯通孔的工序（S102），对基板表面进行蚀刻的工序（S104） 与形成有第一层的表面相对，形成与通孔连通并露出第一层的开口;以及在第一层上形成第二层的步骤（S106）。
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公开(公告)号：US20250061606A1
公开(公告)日：2025-02-20
申请号：US18805668
申请日：2024-08-15
Applicant: JEOL Ltd.
Inventor： Yuji Konyuba
Abstract: An electron microscope includes an electron optical system that irradiates a sample with an electron beam to form an image with electrons transmitted through the sample, a camera that includes an image sensor having sensor pixels and captures frame images that are based on output values output from each of the sensor pixels by incidence of the electrons on the image sensor, and a correction coefficient calculation unit that calculates correction coefficients for correcting sensitivities of the sensor pixels. The correction coefficient calculation unit determines, from the frame images captured under a condition under which the electrons incident on the image sensor follow a Poisson process, a mode value of the output values for each of the sensor pixels, and calculates the correction coefficients based on the mode value determined for each of the sensor pixels.
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公开(公告)号：US11658000B2
公开(公告)日：2023-05-23
申请号：US16916720
申请日：2020-06-30
Applicant: JEOL Ltd.
Inventor： Yuji Konyuba , Tomohiro Haruta , Yuta Ikeda , Tomohisa Fukuda
CPC classification number: H01J37/20 , H01J37/26 , H01J2237/2002 , H01J2237/2007
Abstract: There is provided a sample support capable of easily placing a sample into position. The sample support is used such that a sample floating on the surface of water is scooped and held. The sample support has: a first region on which the sample is to be placed; and a second region of higher wettability than the first region.
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公开(公告)号：US20200371331A1
公开(公告)日：2020-11-26
申请号：US16879904
申请日：2020-05-21
Applicant: JEOL Ltd.
Inventor： Yuta Ikeda , Tomohiro Haruta , Katsunori Ichikawa , Tomohisa Fukuda , Yuji Konyuba
Abstract: An image processing method includes: acquiring an optical microscope image of a specimen; acquiring a transmission electron microscope image of the specimen having been thinned; and superimposing the optical microscope image on the transmission electron microscope image and causing a display section to display the superimposed images, and in superimposing the optical microscope image on the transmission electron microscope image and causing the display section to display the superimposed images, the optical microscope image is distorted to match a field of view of the optical microscope image with a field of view of the transmission electron microscope image.
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公开(公告)号：US10541111B2
公开(公告)日：2020-01-21
申请号：US15989459
申请日：2018-05-25
Applicant: JEOL Ltd.
Inventor： Yuji Konyuba , Kazuya Omoto , Hidetaka Sawada
Abstract: A distortion measurement method for an electron microscope image includes: loading a distortion measurement specimen having structures arranged in a lattice to a specimen plane of an electron microscope or a plane conjugate to the specimen plane in order to obtain an electron microscope image of the distortion measurement specimen; and measuring a distortion from the obtained electron microscope image of the distortion measurement specimen.
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