Metal resistors integrated into poly-open-chemical-mechanical-polishing (POC) module and method of production thereof
Abstract:
A device including RM below the top surface of an HKMG structure, and method of production thereof. Embodiments include first and second HKMG structures over a portion of the substrate and on opposite sides of the STI region, the first and second HKMG structures having a top surface; and a RM over the STI region and between the first and second HKMG structures, wherein the RM is below the top surface of the first and second HKMG structures.
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