Invention Grant
- Patent Title: Photodetection device with overdoped interdiode network and manufacturing method
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Application No.: US15491538Application Date: 2017-04-19
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Publication No.: US10546886B2Publication Date: 2020-01-28
- Inventor: Johan Rothman
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR Paris
- Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee Address: FR Paris
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1653666 20160426
- Main IPC: H01L25/16
- IPC: H01L25/16 ; H01L27/146 ; H01L31/0296

Abstract:
The invention relates to a photodetection device comprising a substrate and a diodes network, the substrate comprising an absorption layer and each diode comprising a collection region with a first type of doping in the absorption layer. The device comprises a conduction mesh under the surface of the substrate, comprising at least one conduction channel inserted between the collection regions of two adjacent diodes, the at least one conduction channel having a second doping type opposite the first type and a higher doping density than the absorption layer. The doping density of the at least one conduction channel is derived from metal diffusion in the absorption layer from a metal mesh present on the substrate surface. The absorption layer has the first doping type. The invention also relates to a method of making such a device.
Public/Granted literature
- US20170309663A1 PHOTODETECTION DEVICE WITH OVERDOPED INTERDIODE NETWORK AND MANUFACTURING METHOD Public/Granted day:2017-10-26
Information query
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