Invention Grant
- Patent Title: N-channel bipolar power semiconductor device with P-layer in the drift volume
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Application No.: US16421862Application Date: 2019-05-24
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Publication No.: US10546939B2Publication Date: 2020-01-28
- Inventor: Roman Baburske , Markus Bina , Hans-Joachim Schulze , Oana Julia Spulber
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Priority: DE102016112721 20160712
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/06 ; H01L29/78 ; H01L29/36 ; H01L29/739 ; H01L29/10 ; H01L29/08

Abstract:
A power semiconductor device having a semiconductor body configured to conduct a load current is disclosed. In one example, the device includes a source region having dopants of a first conductivity type; a semiconductor channel region implemented in the semiconductor body and separating the source region from a remaining portion of the semiconductor body; a trench of a first trench type extending in the semiconductor body along an extension direction and being arranged adjacent to the semiconductor channel region, the trench of the first trench type including a control electrode that is insulated from the semiconductor body. The semiconductor body further comprises: a barrier region and a drift volume having at least a first drift region wherein the barrier region couples the first drift region with the semiconductor channel region.
Public/Granted literature
- US20190288088A1 N-CHANNEL BIPOLAR POWER SEMICONDUCTOR DEVICE WITH P-LAYER IN THE DRIFT VOLUME Public/Granted day:2019-09-19
Information query
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