- 专利标题： Chemical compositions and methods for remediating hydrogen sulfide and other contaminants in hydrocarbon based liquids and aqueous solutions without the formation of precipitates or scale
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申请号： US16254089申请日： 2019-01-22
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公开(公告)号： US10550337B2公开(公告)日： 2020-02-04
- 发明人: Cliffton Lee Roe , Linda Schweitzer
- 申请人： GAPS TECHNOLOGY, LLC
- 申请人地址： US LA Slidell
- 专利权人： GAPS Technology, LLC.
- 当前专利权人： GAPS Technology, LLC.
- 当前专利权人地址： US LA Slidell
- 代理机构： Carrier Blackman & Associates, P.C.
- 代理商 Joseph P. Carrier; William D. Blackman
- 主分类号： C02F1/50
- IPC分类号： C02F1/50 ; C02F1/66 ; C10G19/02 ; C10G29/02 ; C10G29/04 ; C10G29/20 ; C10G53/12 ; C02F103/36 ; C02F101/10 ; C02F103/18 ; C02F103/10
摘要：
A treatment process for remediating a contaminated liquid containing more than 5 ppm hydrogen sulfide (H2S) and substantially without formation of precipitate, includes steps of steps of adding an aqueous solution containing at least one hydroxide compound at a collective concentration of 35-55 wt % to the contaminated liquid to achieve a concentration of 125-5000 ppm of the hydroxide compounds in the contaminated liquid, adding at least one organic acid and to the liquid to achieve a concentration of 0.01-10 ppm in the contaminated liquid, and dispersing the aqueous solution and the at least one organic acid in the contaminated liquid and allowing the aqueous solution and the at least one organic acid to react with the contaminated liquid for a period of time until a concentration of hydrogen sulfide in the contaminated liquid is reduced to ≤5 ppm.
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