Invention Grant
- Patent Title: Systems and methods for optimal source material deposition along hole edges
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Application No.: US14632158Application Date: 2015-02-26
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Publication No.: US10557194B2Publication Date: 2020-02-11
- Inventor: Michael Task , Russell A. Beers
- Applicant: UNITED TECHNOLOGIES CORPORATION
- Applicant Address: US CT Farmington
- Assignee: UNITED TECHNOLOGIES CORPORATION
- Current Assignee: UNITED TECHNOLOGIES CORPORATION
- Current Assignee Address: US CT Farmington
- Agency: Cantor Colburn LLP
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/32 ; H01J37/32 ; C23C14/14

Abstract:
A method for depositing a coating of a source material onto a panel is disclosed. The method includes providing a cathodic arc, the cathodic arc including a target surface, the target surface disposed along a target deposition axis and able to emit the source material as a generally cloud of source material vapor and a generally conical stream of liquid particles of the source material. The method further includes positioning the panel relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles o the source material. The method may further include emitting the source material from the target surface as the generally conical cloud of source material vapor and coating the edge with the cloud of source material vapor to provide an edge coating.
Public/Granted literature
- US20160251753A1 Systems and Methods for Optimal Source Material Deposition Along Hole Edges Public/Granted day:2016-09-01
Information query
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