Systems and methods for optimal source material deposition along hole edges

    公开(公告)号:US10557194B2

    公开(公告)日:2020-02-11

    申请号:US14632158

    申请日:2015-02-26

    Abstract: A method for depositing a coating of a source material onto a panel is disclosed. The method includes providing a cathodic arc, the cathodic arc including a target surface, the target surface disposed along a target deposition axis and able to emit the source material as a generally cloud of source material vapor and a generally conical stream of liquid particles of the source material. The method further includes positioning the panel relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles o the source material. The method may further include emitting the source material from the target surface as the generally conical cloud of source material vapor and coating the edge with the cloud of source material vapor to provide an edge coating.

    Systems and Methods for Optimal Source Material Deposition Along Hole Edges
    2.
    发明申请
    Systems and Methods for Optimal Source Material Deposition Along Hole Edges 审中-公开
    沿边缘最佳源材料沉积的系统和方法

    公开(公告)号:US20160251753A1

    公开(公告)日:2016-09-01

    申请号:US14632158

    申请日:2015-02-26

    Abstract: A method for depositing a coating of a source material onto a panel is disclosed. The method includes providing a cathodic arc, the cathodic arc including a target surface, the target surface disposed along a target deposition axis and able to emit the source material as a generally cloud of source material vapor and a generally conical stream of liquid particles of the source material. The method further includes positioning the panel relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles o the source material. The method may further include emitting the source material from the target surface as the generally conical cloud of source material vapor and coating the edge with the cloud of source material vapor to provide an edge coating.

    Abstract translation: 公开了一种将源材料的涂层沉积到面板上的方法。 该方法包括提供阴极弧,阴极弧包括目标表面,目标表面沿着靶沉积轴线设置,并且能够将源材料作为大体上的源材料蒸气云和大致圆锥形的液体颗粒流 源材料。 该方法还包括基于沉积角度,沉积角度位于靶材表面之间的沉积角度与源材料上的大致圆锥形的液体颗粒流的外部极限之间相对于目标表面定位面板。 该方法可以进一步包括将来自目标表面的源材料作为大体圆锥形的源材料蒸气发射并且用源材料蒸气云覆盖边缘以提供边缘涂层。

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