Invention Grant
- Patent Title: Compositions comprising sulfonamide material and processes for photolithography
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Application No.: US14685290Application Date: 2015-04-13
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Publication No.: US10558122B2Publication Date: 2020-02-11
- Inventor: Deyan Wang , Chunyi Wu , George G. Barclay , Cheng-Bai Xu
- Applicant: Rohm and Haas Electronic Materials, LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials, LLC
- Current Assignee: Rohm and Haas Electronic Materials, LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/04 ; G03F7/039 ; G03F7/004 ; G03F7/038 ; G03F7/075
Abstract:
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
Public/Granted literature
- US20160070172A1 COMPOSITIONS COMPRISING SULFONAMIDE MATERIAL AND PROCESSES FOR PHOTOLITHOGRAPHY Public/Granted day:2016-03-10
Information query
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