Invention Grant
- Patent Title: Fabrication of vertical transport fin field effect transistors with a self-aligned separator and an isolation region with an air gap
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Application No.: US16013010Application Date: 2018-06-20
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Publication No.: US10559491B2Publication Date: 2020-02-11
- Inventor: Kangguo Cheng , Zuoguang Liu , Sebastian Naczas , Heng Wu , Peng Xu
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Tutunjian & Bitetto, P.C.
- Agent Vazken Alexanian
- Main IPC: H01L21/76
- IPC: H01L21/76 ; H01L21/764 ; H01L29/06 ; H01L29/423 ; H01L29/786 ; H01L21/8234 ; H01L27/088

Abstract:
A method of forming a vertical transport fin field effect transistor with self-aligned dielectric separators, including, forming a bottom source/drain region on a substrate, forming at least two vertical fins on the bottom source/drain region, forming a protective spacer on the at least two vertical fins, forming a sacrificial liner on the protective spacer, forming an isolation channel in the bottom source/drain region and substrate between two of the at least two vertical fins, forming an insulating plug in the isolation channel, wherein the insulating plug has a pinch-off void within the isolation channel, and forming the dielectric separator on the insulating plug.
Public/Granted literature
Information query
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