Invention Grant
- Patent Title: Photosensitive resin composition, lithographic printing plate precursor, and method for producing lithographic printing plate
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Application No.: US15278715Application Date: 2016-09-28
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Publication No.: US10564545B2Publication Date: 2020-02-18
- Inventor: Rena Mukaiyama , Atsuyasu Nozaki , Takashi Sato , Kotaro Asano
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-074367 20140331; JP2014-176551 20140829
- Main IPC: G03F7/32
- IPC: G03F7/32 ; G03F7/039 ; B41C1/10 ; G03F7/09 ; G03F7/20
Abstract:
A photosensitive resin composition contains a polymer compound having a linking group represented by Formula A-1 in the main chain; and an infrared absorbing material. In Formula A-1, R1 and R2 each independently represent a hydrogen atom or a monovalent organic group, and X1 is a specific linking group.
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