发明授权
- 专利标题： Structure and method to fabricate highly reactive physical vapor deposition target
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申请号： US15497841申请日： 2017-04-26
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公开(公告)号： US10570504B2公开(公告)日： 2020-02-25
- 发明人: Stephen L. Brown , Bruce B. Doris , Mark C. Reuter
- 申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 代理机构： Tutunjian & Bitetto, P.C.
- 代理商 Vazken Alexanian
- 主分类号： C23C14/34
- IPC分类号： C23C14/34 ; C23C14/06
摘要：
A physical vapor deposition (PVD) target that includes a body composed of material that is reactive with an oxygen containing atmosphere; and a non-reactive cap layer encapsulating at least a sputter surface of the body. The non-reactive cap layer is a barrier obstructing the diffusion of oxygen containing species to the body of the PVD target.