Invention Grant
- Patent Title: Substrate measurement recipe design of, or for, a target including a latent image
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Application No.: US16323849Application Date: 2017-07-21
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Publication No.: US10578982B2Publication Date: 2020-03-03
- Inventor: Hans Van Der Laan , Mir Homayoun Shahrjerdy
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2017/068465 WO 20170721
- International Announcement: WO2018/033342 WO 20180222
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20

Abstract:
A method including computing, in accordance with one or more parameters of a substrate measurement recipe, measurement with a latent image of a target and measurement with a post-development image corresponding to the latent image, to evaluate a characteristic determined from the computed measurement with the latent image of the target and determined from the computed measurement with the post-development image corresponding to the latent image; and adjusting the one or more parameters of the substrate measurement recipe and re-performing the computing, until a certain termination condition is satisfied with respect to the characteristic.
Public/Granted literature
- US20190171116A1 SUBSTRATE MEASUREMENT RECIPE DESIGN OF, OR FOR, A TARGET INCLUDING A LATENT IMAGE Public/Granted day:2019-06-06
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