Invention Grant
- Patent Title: Manufacturing method of glass substrate with hole
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Application No.: US15666946Application Date: 2017-08-02
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Publication No.: US10584053B2Publication Date: 2020-03-10
- Inventor: Motoshi Ono
- Applicant: AGC Inc.
- Applicant Address: JP Chiyoda-ku
- Assignee: AGC Inc.
- Current Assignee: AGC Inc.
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-154627 20160805
- Main IPC: C03B33/08
- IPC: C03B33/08 ; B23K26/382 ; B23K26/402 ; C03B17/06 ; C03C15/00 ; B23K26/00 ; B23K26/359 ; B23K26/352 ; C03C23/00 ; B23K103/00

Abstract:
A manufacturing method of a glass substrate with a hole having a diameter ϕf, and with a thickness θf includes setting a thickness θ1 of a glass plate that is to be processed; preparing a glass plate with the thickness θ1, having first and second surfaces opposite to each other; forming one initial characteristic object or two or more initial characteristic objects in the glass plate by irradiating the glass plate with a laser from a side of the first surface of the glass plate, the initial characteristic object having a size of a diameter ϕ1 on the first surface; and performing wet etching for the glass plate having the initial characteristic object, so that from the initial characteristic object a hole having the diameter ϕf on the first surface is formed, and a thickness of the glass plate is adjusted from θ1 to a target value of θf.
Public/Granted literature
- US20180037489A1 MANUFACTURING METHOD OF GLASS SUBSTRATE WITH HOLE Public/Granted day:2018-02-08
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