Invention Grant
- Patent Title: Method of determining a value of a parameter of interest of a target formed by a patterning process
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Application No.: US16385651Application Date: 2019-04-16
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Publication No.: US10585048B2Publication Date: 2020-03-10
- Inventor: Samee Ur Rehman , Anagnostis Tsiatmas , Sergey Tarabrin , Joannes Jitse Venselaar , Alexandru Onose , Mariya Vyacheslavivna Medvedyeva
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP18168041 20180418
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01N21/95 ; G01N21/956 ; G03F9/00

Abstract:
Methods of determining a value of a parameter of interest are disclosed. In one arrangement, a symmetric component and an asymmetric component of a detected pupil representation from illuminating a target are derived. A first metric characterizing the symmetric component and a second metric characterizing the asymmetric component vary non-monotonically as a function of the parameter of interest over a reference range of values of the parameter of interest. A combination of the derived symmetric component and the derived asymmetric component are used to identify a correct value from a plurality of candidate values of the parameter of interest.
Public/Granted literature
- US20190323972A1 METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A TARGET FORMED BY A PATTERNING PROCESS Public/Granted day:2019-10-24
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