- 专利标题: Nanostructured aluminum alloys for improved hardness
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申请号: US15482678申请日: 2017-04-07
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公开(公告)号: US10590558B2公开(公告)日: 2020-03-17
- 发明人: Evgeniya Freydina , Joshua Garth Abbott , Alan C. Lund , Robert Daniel Hilty , Shiyun Ruan , Jason Reese , Lisa J. Chan , James A. Wright , James A. Curran
- 申请人: Xtalic Corporation
- 申请人地址: US MA Marlborough
- 专利权人: XTALIC CORPORATION
- 当前专利权人: XTALIC CORPORATION
- 当前专利权人地址: US MA Marlborough
- 代理机构: Dorsey & Whitney LLP
- 主分类号: C25D5/18
- IPC分类号: C25D5/18 ; C25D3/44 ; C22C21/00 ; C25D11/04 ; C25D7/00 ; B32B15/01 ; H05K5/04 ; C25D5/48 ; C25D3/66 ; H04M1/02 ; C25D1/00 ; C25D11/24
摘要:
Techniques for forming an enclosure comprised of an aluminum alloy are disclosed. In some embodiments, aluminum ions and metal element ions can be dissolved in a non-aqueous ionic liquid in an electrolytic plating bath. A reverse pulsed electric current can facilitate in co-depositing the aluminum ions and the metal element ions onto a metal substrate. The resulting aluminum alloy layer can include nanocrystalline structures, which can impart the alloy layer with increased hardness and increased resistance to scratching, corrosion, and abrasion. In some embodiments, the metal element ion is chromium and the aluminum alloy layer includes a chromium oxide passivation layer formed via a passivation process. Subsequent to the passivation process, the formation of the chromium oxide layer does not impart a change in color to the aluminum alloy layer. In some embodiments, hafnium ions are co-deposited with aluminum ions to form an aluminum hafnium alloy.
公开/授权文献
- US20180087173A1 NANOSTRUCTURED ALUMINUM ALLOYS FOR IMPROVED HARDNESS 公开/授权日:2018-03-29
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