Invention Grant
- Patent Title: Defect inspection method and defect inspection apparatus
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Application No.: US15417558Application Date: 2017-01-27
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Publication No.: US10593032B2Publication Date: 2020-03-17
- Inventor: Sung-Yoon Ryu , Joon-Seo Song , Yu-Sin Yang , Chung-Sam Jun , Yun-Jung Jee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Onello & Mello, LLP
- Priority: KR10-2016-0104096 20160817
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G01N21/88 ; G06K9/00 ; G01B11/00 ; G06T7/00 ; G01N21/956 ; H01L21/66 ; G02B21/00 ; G06T7/11 ; G06T7/174 ; G01N23/2251 ; H01J37/22

Abstract:
In a defect inspection method, first and second inspection conditions having a first sensitivity of detection signal and having a second sensitivity of a detection signal for a defect of interest (DOI), respectively, are determined. The first and second sensitivities are different. First and second images of the same detection region on a substrate surface under the first and second inspection conditions respectively, are obtained. The first and second images are matched to detect a defect in the detection region.
Public/Granted literature
- US20180053295A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS Public/Granted day:2018-02-22
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