Invention Grant
- Patent Title: Reduction of surface roughness in epitaxially grown germanium by controlled thermal oxidation
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Application No.: US15624603Application Date: 2017-06-15
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Publication No.: US10600640B2Publication Date: 2020-03-24
- Inventor: Woo-Shik Jung , Yeul Na , Youngsik Kim , Jae Hyung Lee , Jin Hyung Lee
- Applicant: Stratio, Inc.
- Applicant Address: US CA Palo Alto
- Assignee: Stratio, Inc.
- Current Assignee: Stratio, Inc.
- Current Assignee Address: US CA Palo Alto
- Agency: Morgan, Lewis & Bockius LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/302 ; H01L21/324 ; H01L21/265 ; H01L21/311 ; H01L21/306
Abstract:
Methods for reducing surface roughness of germanium are described herein. In some embodiments, the surface roughness is reduced by thermal oxidation of germanium. In some embodiments, the surface roughness is further reduced by controlling a rate of the thermal oxidation. In some embodiments, the surface roughness is reduced by thermal annealing.
Public/Granted literature
- US20170287706A1 Reduction of Surface Roughness in Epitaxially Grown Germanium by Controlled Thermal Oxidation Public/Granted day:2017-10-05
Information query
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