Invention Grant
- Patent Title: Flowmeter
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Application No.: US16307030Application Date: 2018-06-13
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Publication No.: US10605636B2Publication Date: 2020-03-31
- Inventor: Ryo Eguchi , Naotsugu Seko , Kazutoshi Ito
- Applicant: CKD CORPORATION
- Applicant Address: JP Komaki-shi
- Assignee: CKD CORPORATION
- Current Assignee: CKD CORPORATION
- Current Assignee Address: JP Komaki-shi
- Agency: Oliff PLC
- Priority: JP2017-154415 20170809
- International Application: PCT/JP2018/022586 WO 20180613
- International Announcement: WO2019/031056 WO 20190214
- Main IPC: G01F1/42
- IPC: G01F1/42 ; G01F1/00 ; G01F1/68 ; G01F15/10

Abstract:
A flowmeter including a sensor passage disposed with a sensor chip for measuring a flow rate and an orifice passage as a bypass passage placed with respect to the sensor passage is provided. The orifice passage has a passage diameter which is smaller than a passage diameter of an inflow passage, a distribution orifice is placed on an inlet side of the sensor passage, and the orifice passage and the distribution orifice are configured such that changing trends in an effective sectional area becomes same in a graph including a vertical axis indicating the effective sectional area and a lateral axis indicating a fluid pressure of a fluid.
Public/Granted literature
- US20190277675A1 FLOWMETER Public/Granted day:2019-09-12
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