Invention Grant
- Patent Title: Multi-function semiconductor and electronics processing
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Application No.: US15934714Application Date: 2018-03-23
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Publication No.: US10649241B2Publication Date: 2020-05-12
- Inventor: David Martin Hemenway , Ken Gross , Dahv A. V. Kliner , Roger Farrow
- Applicant: nLIGHT, Inc.
- Applicant Address: US WA Vancouver
- Assignee: NLIGHT, INC.
- Current Assignee: NLIGHT, INC.
- Current Assignee Address: US WA Vancouver
- Agency: Schwabe Williamson & Wyatt
- Main IPC: G02F1/01
- IPC: G02F1/01 ; G02B27/09 ; G02B6/42 ; G02B6/255 ; G02B6/26 ; G02B6/036 ; G02B6/028 ; B23K26/06 ; B23K26/21 ; B23K26/073 ; B23K26/38 ; B23K1/00 ; B23K26/34 ; B23K1/005 ; B23K101/42

Abstract:
A method of tailoring beam characteristics of a laser beam during fabrication of an electronic device. The method includes: providing a substrate comprising one or more layers; adjusting one or more characteristics of a laser beam; and impinging the laser beam having the adjusted beam characteristics on the substrate to carry out at least one process step for fabricating the electronic device. The adjusting of the laser beam comprises: perturbing the laser beam propagating within a first length of fiber to adjust the one or more beam characteristics of the laser beam in the first length of fiber or a second length of fiber or a combination thereof, the second length of fiber having two or more confinement regions; coupling the perturbed laser beam into the second length of fiber; and emitting the laser beam having the adjusted beam characteristics from the second length of fiber.
Public/Granted literature
- US20180284490A1 MULTI-FUNCTION SEMICONDUCTOR AND ELECTRONICS PROCESSING Public/Granted day:2018-10-04
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