- 专利标题: Charged particle beam device
-
申请号: US16089269申请日: 2016-03-31
-
公开(公告)号: US10651004B2公开(公告)日: 2020-05-12
- 发明人: Yasuhiro Shirasaki , Momoyo Enyama
- 申请人: HITACHI, LTD.
- 申请人地址: JP Tokyo
- 专利权人: HITACHI, LTD.
- 当前专利权人: HITACHI, LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Miles & Stockbridge, P.C.
- 国际申请: PCT/JP2016/060781 WO 20160331
- 国际公布: WO2017/168709 WO 20171005
- 主分类号: H01J37/05
- IPC分类号: H01J37/05 ; H01J37/26 ; H01J37/147 ; H01J37/153 ; H01J37/28
摘要:
A charged particle beam device that detects a secondary charged particle beam generated by irradiation of a sample by a primary charged particle beam, includes: an image shift deflector that shifts an irradiation region for irradiation of the sample by the primary charged particle beam; a magnetic sector that separates the primary charged particle beam passing therein from the secondary charged particle beam from the sample using a magnetic field generated therein; a correction mechanism that is placed off of a trajectory of the primary charged particle beam but on a trajectory of the secondary charged particle beam inside the magnetic sector, the correction mechanism deflecting the secondary charged particle beam passing through; and a controller that controls the correction mechanism according to a defined relationship between a shift amount by the image shift deflector and a correction amount by the correction mechanism.
公开/授权文献
- US20190131104A1 CHARGED PARTICLE BEAM DEVICE 公开/授权日:2019-05-02
信息查询