Invention Grant
- Patent Title: Thin film transistor and method of manufacturing the same
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Application No.: US15826011Application Date: 2017-11-29
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Publication No.: US10651255B2Publication Date: 2020-05-12
- Inventor: Ajeong Choi , Suk Gyu Hahm , Jeong Il Park , Yong Uk Lee , Jong Won Chung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co. Ltd.
- Current Assignee: Samsung Electronics Co. Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7359c80
- Main IPC: H01L27/32
- IPC: H01L27/32 ; H01L51/00 ; G09G3/3233 ; G09G3/3283 ; G09G3/36 ; H01L51/05

Abstract:
Disclosed are a thin film transistor including a gate electrode, a semiconductor layer, a source electrode, and a drain electrode. The semiconductor layer overlaps the gate electrode. The source electrode and the drain electrode are electrically connected to the semiconductor layer. The semiconductor layer includes a first semiconductor layer including a first organic semiconductor material and a second semiconductor layer including a second organic semiconductor material. The second semiconductor layer is farther spaced apart from the gate electrode than the first semiconductor layer. A HOMO energy level of the second organic semiconductor material is different from a HOMO energy level of the first organic semiconductor material. A method of manufacturing the thin film transistor is disclosed.
Public/Granted literature
- US20190035868A1 THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2019-01-31
Information query
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