- 专利标题： Metallic layer comprising alkali metal and second metal
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申请号： US15774634申请日： 2016-11-09
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公开(公告)号： US10651387B2公开(公告)日： 2020-05-12
- 发明人: Tomas Kalisz , Francois Cardinali , Jerome Ganier , Uwe Gölfert , Vygintas Jankus , Carsten Rothe , Benjamin Schulze , Steffen Willmann
- 申请人： Novaled GmbH
- 申请人地址： DE Dresden
- 专利权人： Novaled GmbH
- 当前专利权人： Novaled GmbH
- 当前专利权人地址： DE Dresden
- 代理机构： Eversheds Sutherland (US) LLP
- 优先权： com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2260b2b6
- 国际申请： PCT/EP2016/077132 WO 20161109
- 国际公布： WO2017/081074 WO 20170518
- 主分类号： H01L51/00
- IPC分类号： H01L51/00 ; H01L51/50 ; C23C14/14 ; C23C14/24 ; C23C28/00 ; H01L51/44 ; H01L51/52
摘要：
The present invention relates to a metallic layer adjacent to a semiconducting layer comprising a substantially covalent matrix material, the metallic layer comprising at least one first metal and at least one second metal, wherein a) the first metal is selected from the group consisting of Li, Na, K, Rb, Cs; and b) the second metal is selected from the group consisting of Zn, Hg, Cd, Te, electronic devices comprising such materials and process for preparing the same.
公开/授权文献
- US20180331292A1 Metallic Layer Comprising Alkali Metal and Second Metal 公开/授权日：2018-11-15
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