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公开(公告)号:US20180351100A1
公开(公告)日:2018-12-06
申请号:US15774627
申请日:2016-11-09
申请人: Novaled GmbH
发明人: Tomas Kalisz , Francois Cardinali , Jerome Ganier , Uwe Gölfert , Vygintas Jankus , Carsten Rothe , Benjamin Schulze , Steffen Willmann
摘要: The present invention relates to a semiconducting material comprising (i) a substantially covalent matrix material consisting of at least one substantially covalent matrix compound, (ii) at least one first metal selected from the group consisting of Li, Na, K, Rb, and Cs, and (iii) at least one second metal selected from the group consisting of Zn, Hg, Cd and Te, electronic devices comprising such materials and processes for preparing the same.
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公开(公告)号:US10886491B2
公开(公告)日:2021-01-05
申请号:US15774639
申请日:2016-11-10
申请人: Novaled GmbH
发明人: Tomas Kalisz , Francois Cardinali , Jerome Ganier , Uwe Gölfert , Vygintas Jankus , Carsten Rothe , Benjamin Schulze , Steffen Willmann
摘要: Process for preparing a metal containing layer, the process comprising (i) at least one step of co-vaporization, at a pressure which is lower than 10−2 Pa, of a) at least one first metal selected from Li, Na, K, Rb and Cs and b) at least one second metal selected Mg, Zn, Hg, Cd and Te from a metal alloy provided in a first vaporization source which is heated to a temperature between 100° C. and 600° C., and (ii) at least one subsequent step of deposition of the first metal on a surface having a temperature which is below the temperature of the first vaporization source, wherein in step (i), the alloy is provided at least partly in form of a homogeneous phase comprising the first metal and the second metal, electronic devices comprising such materials and process for preparing the same.
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公开(公告)号:US20190207116A1
公开(公告)日:2019-07-04
申请号:US16329018
申请日:2017-08-30
申请人: Novaled GmbH
发明人: Steffen Runge , Carsten Rothe , Julien Frey , Uwe Gölfert
IPC分类号: H01L51/00
CPC分类号: H01L51/0052 , H01L51/001 , H01L51/0058 , H01L51/0071 , H01L51/0072 , H01L51/0077 , H01L51/008 , H01L51/0085 , H01L51/5076 , H01L51/5092 , H01L51/56
摘要: The present invention relates to a method for preparing an organic semiconductor layer in a vacuum chamber at a pressure of 10−5 to 10−9 mbar comprising a step of sublimating a composition from a single vacuum thermal evaporation source arranged in the vacuum chamber, wherein the composition comprises a physical mixture of (a) a first organic aromatic matrix compound having a molecular weight ≥400 and ≤1,000: and (b) a first alkali organic complex having a molecular weight of ≥100 and ≤400.
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公开(公告)号:US10937966B2
公开(公告)日:2021-03-02
申请号:US16329018
申请日:2017-08-30
申请人: Novaled GmbH
发明人: Steffen Runge , Carsten Rothe , Julien Frey , Uwe Gölfert
摘要: The present invention relates to a method for preparing an organic semiconductor layer in a vacuum chamber at a pressure of 10−5 to 10−9 mbar comprising a step of sublimating a composition from a single vacuum thermal evaporation source arranged in the vacuum chamber, wherein the composition comprises a physical mixture of (a) a first organic aromatic matrix compound having a molecular weight ≥400 and ≤1,000: and (b) a first alkali organic complex having a molecular weight of ≥100 and ≤400.
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公开(公告)号:US10811608B2
公开(公告)日:2020-10-20
申请号:US15774627
申请日:2016-11-09
申请人: Novaled GmbH
发明人: Tomas Kalisz , Francois Cardinali , Jerome Ganier , Uwe Gölfert , Vygintas Jankus , Carsten Rothe , Benjamin Schulze , Steffen Willmann
摘要: The present invention relates to a semiconducting material comprising (i) a substantially covalent matrix material consisting of at least one substantially covalent matrix compound, (ii) at least one first metal selected from the group consisting of Li, Na, K, Rb, and Cs, and (iii) at least one second metal selected from the group consisting of Zn, Hg, Cd and Te, electronic devices comprising such materials and processes for preparing the same.
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公开(公告)号:US10651387B2
公开(公告)日:2020-05-12
申请号:US15774634
申请日:2016-11-09
申请人: Novaled GmbH
发明人: Tomas Kalisz , Francois Cardinali , Jerome Ganier , Uwe Gölfert , Vygintas Jankus , Carsten Rothe , Benjamin Schulze , Steffen Willmann
摘要: The present invention relates to a metallic layer adjacent to a semiconducting layer comprising a substantially covalent matrix material, the metallic layer comprising at least one first metal and at least one second metal, wherein a) the first metal is selected from the group consisting of Li, Na, K, Rb, Cs; and b) the second metal is selected from the group consisting of Zn, Hg, Cd, Te, electronic devices comprising such materials and process for preparing the same.
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公开(公告)号:US11355721B2
公开(公告)日:2022-06-07
申请号:US15738672
申请日:2016-06-22
申请人: Novaled GmbH
发明人: Uwe Gölfert , Carsten Rothe , Vygintas Jankus
摘要: The present invention relates to an electronic device comprising at least one light emitting layer between an anode and a substantially silver cathode, the device further comprising between the cathode and the anode at least one mixed layer comprising (i) at least one substantially covalent electron transport matrix compound comprising at least one polar group selected from phosphine oxide group or diazole group, and (ii) in substantially elemental form, an electropositive element selected from substantially non-radioactive alkali metals, alkaline earth metals, rare earth metals, and transition metals of the fourth period of the Periodic table having proton numbers 22, 23, 24, 25, 26, 27, 28, 29.
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公开(公告)号:US20190006611A1
公开(公告)日:2019-01-03
申请号:US15774639
申请日:2016-11-10
申请人: Novaled GmbH
发明人: Tomas Kalisz , Francois Cardinali , Jerome Ganier , Uwe Gölfert , Vygintas Jankus , Carsten Rothe , Benjamin Schulze , Steffen Willmann
摘要: Process for preparing a metal containing layer, the process comprising (i) at least one step of co-vaporization, at a pressure which is lower than 10−2 Pa, of a) at least one first metal selected from Li, Na, K, Rb and Cs and b) at least one second metal selected Mg, Zn, Hg, Cd and Te from a metal alloy provided in a first vaporization source which is heated to a temperature between 100° C. and 600° C., and (ii) at least one subsequent step of deposition of the first metal on a surface having a temperature which is below the temperature of the first vaporization source, wherein in step (i), the alloy is provided at least partly in form of a homogeneous phase comprising the first metal and the second metal, electronic devices comprising such materials and process for preparing the same.
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公开(公告)号:US20180331292A1
公开(公告)日:2018-11-15
申请号:US15774634
申请日:2016-11-09
申请人: Novaled GmbH
发明人: Tomas Kalisz , Francois Cardinali , Jerome Ganier , Uwe Gölfert , Vygintas Jankus , Carsten Rothe , Benjamin Schulze , Steffen Willmann
CPC分类号: H01L51/0021 , C23C14/14 , C23C14/24 , C23C28/00 , H01L51/001 , H01L51/002 , H01L51/441 , H01L51/5092 , H01L51/5203 , Y02E10/549
摘要: The present invention relates to a metallic layer adjacent to a semiconducting layer comprising a substantially covalent matrix material, the metallic layer comprising at least one first metal and at least one second metal, wherein a) the first metal is selected from the group consisting of Li, Na, K, Rb, Cs; and b) the second metal is selected from the group consisting of Zn, Hg, Cd, Te, electronic devices comprising such materials and process for preparing the same.
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10.
公开(公告)号:US20180190922A1
公开(公告)日:2018-07-05
申请号:US15738672
申请日:2016-06-22
申请人: Novaled GmbH
发明人: Uwe Gölfert , Carsten Rothe , Vygintas Jankus
CPC分类号: H01L51/5004 , H01L51/002 , H01L51/005 , H01L51/0052 , H01L51/0067 , H01L51/0073 , H01L51/5076 , H01L51/5092 , H01L51/5221 , H01L51/5268 , H01L2251/5315 , H01L2251/5353 , H01L2251/554
摘要: The present invention relates to an electronic device comprising at least one light emitting layer between an anode and a substantially silver cathode, the device further comprising between the cathode and the anode at least one mixed layer comprising (i) at least one substantially covalent electron transport matrix compound comprising at least one polar group selected from phosphine oxide group or diazole group, and (ii) in substantially elemental form, an electropositive element selected from substantially non-radioactive alkali metals, alkaline earth metals, rare earth metals, and transition metals of the fourth period of the Periodic table having proton numbers 22, 23, 24, 25, 26, 27, 28, 29.
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