Invention Grant
- Patent Title: Systems and methods for optimizing focus for imaging-based overlay metrology
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Application No.: US15574294Application Date: 2017-09-14
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Publication No.: US10663281B2Publication Date: 2020-05-26
- Inventor: Amnon Manassen , Andrew Hill
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Hodgson Russ LLP
- International Application: PCT/US2017/051651 WO 20170914
- International Announcement: WO2018/053192 WO 20180322
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01B9/02 ; G03F7/20 ; G01B11/27

Abstract:
Methods and systems for focusing and measuring by mean of an interferometer device, having an optical coherence tomography (OCT) focusing system, by separately directing an overlapped measurement and reference wavefront towards a focus sensor and towards an imaging sensor; where a predefined focusing illumination spectrum of the overlapped wavefront is directed towards the focus sensor, and where a predefined measurement illumination spectrum of the overlapped wavefront is directed towards the imaging sensor. Methods and systems for maintaining focus of an interferometer device, having an OCT focusing system, during sample's stage moves.
Public/Granted literature
- US20180292198A1 Systems and Methods for Optimizing Focus for Imaging-Based Overlay Metrology Public/Granted day:2018-10-11
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