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    Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
    1.
    发明授权
    Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology 有权

    公开(公告)号：US10126238B2

    公开(公告)日：2018-11-13

    申请号：US15841219

    申请日：2017-12-13

    Applicant: KLA-Tencor Corporation

    Inventor： Amnon Manassen ,  Andrew Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

    IPC: G01N21/55 ,  G01B11/00 ,  G01N21/956 ,  G01N21/95

    Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

    Scatterometry system and method for generating non-overlapping and non-truncated diffraction images
    2.
    发明授权
    Scatterometry system and method for generating non-overlapping and non-truncated diffraction images 有权

    公开(公告)号：US09719920B2

    公开(公告)日：2017-08-01

    申请号：US14497439

    申请日：2014-09-26

    Applicant: KLA-Tencor Corporation

    Inventor： Tzahi Grunzweig ,  Andrew Hill ,  Barry Loevsky

    IPC: G01B11/24 ,  G01N21/47 ,  G03F7/20

    CPC classification number: G01N21/4788 ,  G01B2210/48 ,  G01N2201/06113 ,  G03F7/701 ,  G03F7/70633

    Abstract: Scatterometry measurement systems, illumination configurations and respective methods are provided, which comprise illumination beams that have vertical projections on a target plane comprising both a parallel component and a perpendicular component, with respect to a target measurement direction. The illumination beams propagate at an angle to the plane defined by the measurement direction and a normal to the targets surface and generate diffraction images which are off-center at the imaging pupil plane. The eccentric diffraction images are spatially arranged to avoid overlaps and to correspond to measurement requirements such as spot sizes, number of required diffraction orders and so forth. The illumination beams may be implemented using illumination pupil masks, which provide a simple way to increase scatterometry measurements throughput.

    ILLUMINATION CONFIGURATIONS FOR SCATTEROMETRY MEASUREMENTS
    4.
    发明申请
    ILLUMINATION CONFIGURATIONS FOR SCATTEROMETRY MEASUREMENTS 有权
    用于散射测量的照明配置

    公开(公告)号：US20150022822A1

    公开(公告)日：2015-01-22

    申请号：US14497439

    申请日：2014-09-26

    Applicant: KLA-Tencor Corporation

    Inventor： Tzahi Grunzweig ,  Andrew Hill ,  Barry Loevsky

    IPC: G01B11/24 ,  G01N21/47

    CPC classification number: G01N21/4788 ,  G01B2210/48 ,  G01N2201/06113 ,  G03F7/701 ,  G03F7/70633

    Abstract: Scatterometry measurement systems, illumination configurations and respective methods are provided, which comprise illumination beams that have vertical projections on a target plane comprising both a parallel component and a perpendicular component, with respect to a target measurement direction. The illumination beams propagate at an angle to the plane defined by the measurement direction and a normal to the targets surface and generate diffraction images which are off-center at the imaging pupil plane. The eccentric diffraction images are spatially arranged to avoid overlaps and to correspond to measurement requirements such as spot sizes, number of required diffraction orders and so forth. The illumination beams may be implemented using illumination pupil masks, which provide a simple way to increase scatterometry measurements throughput.

    Abstract translation: 提供散射测量系统，照明配置和各自的方法，其包括相对于目标测量方向在包括平行分量和垂直分量的目标平面上具有垂直投影的照明光束。 照明光束以与测量方向限定的平面成一角度传播，并且与目标表面垂直的方向传播，并产生在成像光瞳平面处偏心的衍射图像。 偏心衍射图像在空间上排列以避免重叠并且对应于测量要求，例如光斑尺寸，所需衍射级数等。 照明光束可以使用照明光瞳屏蔽来实现，其提供了增加散射测量吞吐量的简单方法。

    Systems and Methods for Optimizing Focus for Imaging-Based Overlay Metrology
    5.
    发明申请
    Systems and Methods for Optimizing Focus for Imaging-Based Overlay Metrology 审中-公开

    公开(公告)号：US20200240765A1

    公开(公告)日：2020-07-30

    申请号：US16848056

    申请日：2020-04-14

    Applicant: KLA-Tencor Corporation

    Inventor： Amnon Manassen ,  Andrew Hill

    IPC: G01B9/02 ,  G01B11/27 ,  G03F7/20

    Abstract: Methods and systems for focusing and measuring by mean of an interferometer device, having an optical coherence tomography (OCT) focusing system, by separately directing an overlapped measurement and reference wavefront towards a focus sensor and towards an imaging sensor; where a predefined focusing illumination spectrum of the overlapped wavefront is directed towards the focus sensor, and where a predefined measurement illumination spectrum of the overlapped wavefront is directed towards the imaging sensor. Methods and systems for maintaining focus of an interferometer device, having an OCT focusing system, during sample's stage moves.

    On the fly target acquisition
    6.
    发明授权
    On the fly target acquisition 有权

    公开(公告)号：US10684563B2

    公开(公告)日：2020-06-16

    申请号：US15761830

    申请日：2018-02-19

    Applicant: KLA-TENCOR CORPORATION

    Inventor： Amnon Manassen ,  Andrew Hill ,  Nadav Gutman ,  Yossi Simon ,  Alexander Novikov ,  Eugene Maslovsky

    IPC: G06T7/00 ,  H04N5/372 ,  G06T7/246 ,  G03F7/20 ,  G06T7/73 ,  G03F9/00 ,  G01B11/00

    Abstract: Metrology systems and methods are provided, which derive metrology target position on the wafer and possibly the target focus position during the movement of the wafer on the system's stage. The positioning data is derived before the target arrives its position (on-the-fly), sparing the time required in the prior art for the acquisition stage and increasing the throughput of the systems and methods. The collection channel may be split to provide for an additional moving-imaging channel comprising at least one TDI (time delay and integration) sensor with an associated analysis unit configured to derive wafer surface information, positioning and/or focusing information of the metrology targets with respect to the objective lens, during wafer positioning movements towards the metrology targets. Additional focusing-during-movement module and possibly feedbacking derived position and/or focus information to the stage may enhance the accuracy of the stopping of the stage.

    On The Fly Target Acquisition
    7.
    发明申请
    On The Fly Target Acquisition 审中-公开

    公开(公告)号：US20190228518A1

    公开(公告)日：2019-07-25

    申请号：US15761830

    申请日：2018-02-19

    Applicant: KLA-TENCOR CORPORATION

    Inventor： Amnon Manassen ,  Andrew Hill ,  Nadav Gutman ,  Yossi Simon ,  Alexander Novikov ,  Eugene Maslovsky

    IPC: G06T7/00 ,  H04N5/372 ,  G06T7/73 ,  G06T7/246 ,  G03F7/20

    Abstract: Metrology systems and methods are provided, which derive metrology target position on the wafer and possibly the target focus position during the movement of the wafer on the system's stage. The positioning data is derived before the target arrives its position (on-the-fly), sparing the time required in the prior art for the acquisition stage and increasing the throughput of the systems and methods. The collection channel may be split to provide for an additional moving-imaging channel comprising at least one TDI (time delay and integration) sensor with an associated analysis unit configured to derive wafer surface information, positioning and/or focusing information of the metrology targets with respect to the objective lens, during wafer positioning movements towards the metrology targets. Additional focusing-during-movement module and possibly feedbacking derived position and/or focus information to the stage may enhance the accuracy of the stopping of the stage.

    Reflective pupil relay system
    9.
    发明授权
    Reflective pupil relay system 有权

    公开(公告)号：US10976249B1

    公开(公告)日：2021-04-13

    申请号：US14504234

    申请日：2014-10-01

    Applicant: KLA-Tencor Corporation

    Inventor： Andrew Hill ,  Gregory Brady

    IPC: G01N21/47 ,  G02B19/00

    Abstract: Methods and systems for relaying an optical image using a cascade arrangement of tilted, concave mirrors are presented. An exemplary optical relay system includes a cascade arrangement of four mirrors each having concave, spherical surface figures. The first and third mirrors are configured to focus collimated wavefronts and the second and fourth mirrors re-collimate diverging wavefronts reflected from the first and third mirrors. Each mirror is tilted such that wavefronts located in the local field plane and local pupil plane of each mirror are physically separated. The magnitude and direction of each tilt angle are arranged such that off-axis aberrations introduced by each individual mirrors are largely compensated by the other mirrors. Such an optical relay system is employed to relay images of the pupil plane of a metrology system that is configured to perform accurate measurements of semiconductor structures and materials over a broad range of illumination wavelengths.

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