Invention Grant
- Patent Title: Gas filtration structure and method for filtering gas
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Application No.: US16008763Application Date: 2018-06-14
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Publication No.: US10668429B2Publication Date: 2020-06-02
- Inventor: Yen-Hsun Chi , Chun-Ju Huang , Yu-Li Lin
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@ff0f32a com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2fb863f2
- Main IPC: B01D53/22
- IPC: B01D53/22 ; C01B3/50 ; B01D71/02 ; B01D63/04

Abstract:
A method for filtering gas includes providing a gas filtration structure, and the gas filtration structure includes a porous support and a first gas filtration film pair on the porous support, wherein the first gas filtration film pair includes a first hydrogen permeation layer and a first calcinated layered double hydroxide (c-LDH) layer, and the first hydrogen permeation layer is disposed between the porous support and the first c-LDH layer. The method also provides a hydrogen-containing mixture gas over the first gas filtration film pair, and collects hydrogen under the porous support.
Public/Granted literature
- US20190015776A1 GAS FILTRATION STRUCTURE AND METHOD FOR FILTERING GAS Public/Granted day:2019-01-17
Information query
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