- 专利标题： Multi-layer deposition system and process
-
申请号： US15691593申请日： 2017-08-30
-
公开(公告)号： US10669627B2公开(公告)日： 2020-06-02
- 发明人: Yang Yun , Max Sorenson , Chien-Lan Hsueh , Tining Su , Jim Dempster , Alex Anderson , Layton Baker
- 申请人： HZO, Inc.
- 申请人地址： US NC Morrisville
- 专利权人： HzO, Inc.
- 当前专利权人： HzO, Inc.
- 当前专利权人地址： US NC Morrisville
- 代理机构： Intellectual Strategies
- 主分类号： C23C16/455
- IPC分类号： C23C16/455 ; H01L21/67 ; H01L21/677 ; C23C16/44 ; C23C16/00 ; C23C16/52 ; H01L21/02
摘要：
A modular multilayer deposition system includes a plurality of modular deposition chambers, including at least one parylene deposition chamber and at least one ALD deposition chamber. The parylene deposition chamber is connected in series with the ALD deposition chamber. Substrates are automatically moved from within the parylene deposition chamber to within the ALD deposition chamber or from within the ALD deposition chamber to the parylene deposition chamber.
公开/授权文献
- US20180237909A1 MULTI-LAYER DEPOSITION SYSTEM AND PROCESS 公开/授权日：2018-08-23
信息查询
IPC分类:
