Lithographic apparatus and device manufacturing method

Invention Grant

US10678139B2 Lithographic apparatus and device manufacturing method 有权

Patent Title: Lithographic apparatus and device manufacturing method
Application No.: US16245400

Application Date: 2019-01-11
Publication No.: US10678139B2

Publication Date: 2020-06-09
Inventor: Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Johannes Catherinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Helmar Van Santen , Marcus Adrianus Van De Kerkhof , Mark Kroon , Arie Jeffrey Den Boef , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens
Applicant: ASML NETHERLANDS B.V.
Applicant Address: NL Veldhoven
Assignee: ASML Netherlands B.V.
Current Assignee: ASML Netherlands B.V.
Current Assignee Address: NL Veldhoven
Agency: Pillsbury Winthrop Shaw Pittman LLP
Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@15017922 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3644339e com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@fb47c25
Main IPC: G03F7/20
IPC: G03F7/20

Abstract:

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

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IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/20	.曝光及其设备（复制用照相印制设备入G03B27/00）