Invention Grant
- Patent Title: RPS defect reduction by cyclic clean induced RPS cooling
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Application No.: US15397883Application Date: 2017-01-04
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Publication No.: US10755903B2Publication Date: 2020-08-25
- Inventor: Sidharth Bhatia , Zhili Zuo , Hidehiro Kojiri , Anjana M. Patel , Song-Moon Suh , Ganesh Balasubramanian
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: B08B9/00
- IPC: B08B9/00 ; B08B5/00 ; H01J9/38 ; H01J37/32 ; C23C16/44
Abstract:
A method of cleaning a remote plasma source includes supplying a first cycle of one or more first cleaning gases to a remote plasma source. The method includes supplying a second cycle of one or more second cleaning gases to the remote plasma source. The method includes supplying one or more cooling fluids to one or more cooling conduits coupled with the remote plasma source.
Public/Granted literature
- US20170207069A1 RPS DEFECT REDUCTION BY CYCLIC CLEAN INDUCED RPS COOLING Public/Granted day:2017-07-20
Information query
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