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公开(公告)号：US20240060860A1
公开(公告)日：2024-02-22
申请号：US18493742
申请日：2023-10-24
Applicant: APPLIED MATERIALS, INC.
Inventor： Changgong Wang , Zhili Zuo , Chang Ke , Song-Moon Suh
CPC classification number: G01N1/02 , G01N15/02 , G01N15/065 , G01N15/14 , G01N2015/1497 , G01N2015/0019
Abstract: A distribution unit of a particle detection system initiates a particle collection process to dislodge one or more surface particles from a surface of an article based on a stream including at least one of solid CO2 particles or CO2 droplets. The dislodged surface particles are collected on a surface of a substrate having a pre-determined initial state including initial surface particles of the substrate. A measurement indicating a particle number concentration of detectable surface particles on the substrate after the particle collection process is completed is obtained. An initial particle number concentration of the initial surface particles of the pre-determined initial state is identified. A number of particles transported away from the surface of the article is determined based on the obtained measurement and the identified initial particle concentration.
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公开(公告)号：US20220381653A1
公开(公告)日：2022-12-01
申请号：US17819255
申请日：2022-08-11
Applicant: APPLIED MATERIALS, INC.
Inventor： Changgong Wang , Zhili Zuo , Chang Ke , Song-Moon Suh
Abstract: A stream including at least one of solid CO2 particles or CO2 droplets is directed toward an article including surface particles. The stream causes at least a portion of the surface particles on the article to dislodge from a surface of the article. A purge cycle to transport at least a portion of the dislodged surface particles away from the surface of the article is initiated. The purge cycle includes generating a laminar flow at a first velocity for a first time period and subsequently generating a laminar flow at a second velocity for a second time period. A determination is made of whether a number of particles transported away from the surface of the article satisfies a particle criterion. In response to a determination that the number of particles transported away from the article does not satisfy the criterion, the purge cycle is re-initiated.
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公开(公告)号：US09443714B2
公开(公告)日：2016-09-13
申请号：US13785903
申请日：2013-03-05
Applicant: APPLIED MATERIALS, INC.
Inventor： James Matthew Holden , Song-Moon Suh , Todd Egan , Kalyanjit Ghosh , Leon Volfovski , Michael R. Rice , Richard Giljum
CPC classification number: H01L21/67028 , B01D39/12 , B08B5/00 , B08B7/00 , H01L21/02076 , H01L21/02087 , H01L21/0209 , H01L21/67051
Abstract: A substrate cleaning apparatus may include a substrate support having a support surface to support a substrate to be cleaned, wherein the substrate support is rotatable about a central axis normal to the support surface; a first nozzle to provide a first cleaning gas to a region of the inner volume corresponding to the position of an edge of the substrate when the substrate is supported by the support surface of the substrate support; a first annular body disposed opposite and spaced apart from the support surface of the substrate support by a gap, the first annular body having a central opening defined by an inner wall shaped to provide a reducing size of the gap between the first annular body and the support surface in a radially outward direction; and a first gas inlet to provide a first gas to the central opening of the first annular body.
Abstract translation: 基板清洁装置可以包括具有支撑表面以支撑要清洁的基板的基板支撑件，其中基板支撑件可绕垂直于支撑表面的中心轴线旋转; 第一喷嘴，用于当所述基板由所述基板支撑件的支撑表面支撑时，将第一清洁气体提供到所述内部体积的与所述基板的边缘的位置相对应的区域; 第一环形体，其通过间隙与衬底支撑件的支撑表面相对设置并间隔开，第一环形体具有由内壁限定的中心开口，内壁被成形为提供第一环形体和第二环形体之间的间隙的减小尺寸 支撑表面沿径向向外的方向; 以及第一气体入口，用于向第一环形体的中心开口提供第一气体。
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公开(公告)号：US11815436B2
公开(公告)日：2023-11-14
申请号：US17819255
申请日：2022-08-11
Applicant: APPLIED MATERIALS, INC.
Inventor： Changgong Wang , Zhili Zuo , Chang Ke , Song-Moon Suh
CPC classification number: G01N1/02 , G01N15/02 , G01N15/065 , G01N15/14 , G01N2001/028 , G01N2015/0019 , G01N2015/0294 , G01N2015/1493 , G01N2015/1497
Abstract: A stream including at least one of solid CO2 particles or CO2 droplets is directed toward an article including surface particles. The stream causes at least a portion of the surface particles on the article to dislodge from a surface of the article. A purge cycle to transport at least a portion of the dislodged surface particles away from the surface of the article is initiated. The purge cycle includes generating a laminar flow at a first velocity for a first time period and subsequently generating a laminar flow at a second velocity for a second time period. A determination is made of whether a number of particles transported away from the surface of the article satisfies a particle criterion. In response to a determination that the number of particles transported away from the article does not satisfy the criterion, the purge cycle is re-initiated.
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公开(公告)号：US11555250B2
公开(公告)日：2023-01-17
申请号：US17241241
申请日：2021-04-27
Applicant: Applied Materials, Inc.
Inventor： Yuanhong Guo , Sheng Michael Guo , Marek W Radko , Steven Victor Sansoni , Nagendra Madiwal , Matvey Farber , Pingping Gou , Song-Moon Suh , Jeffrey C. Hudgens , Yuji Murayama , Anurag Bansal , Shaofeng Chen , Michael Kuchar
Abstract: A method includes receiving a metal component including a raw surface that includes a metal base, a first native oxide disposed on the metal base, and hydrocarbons disposed on the metal base. The method further includes machining the raw surface of the metal component to remove the first native oxide and a first portion of the hydrocarbons from the metal base. The machining generates an as-machined surface of the metal component including the metal base without the first native oxide and without the first portion of the hydrocarbons. The method further includes performing a surface machining of the as-machined surface of the metal component to remove a second portion of the hydrocarbons. The method further includes surface treating the metal component to remove a third portion of the hydrocarbons. The method further includes performing a cleaning of the metal component and drying the metal component.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190210061A1
公开(公告)日：2019-07-11
申请号：US16242184
申请日：2019-01-08
Applicant: Applied Materials, Inc.
Inventor： Chang Ke , Song-Moon Suh , Liqi Wu , Michael S. Jackson , Lei Zhou , Biao Liu , Cheng Pan , Paul F. Ma , Mei Chang
IPC: B05D3/04 , B05D1/00 , C23C16/455 , C23C16/04
CPC classification number: B05D3/044 , B05D1/60 , B05D3/0453 , C23C16/042 , C23C16/45544 , C23C16/45563
Abstract: Methods and apparatus for removing deposits in self-assembled monolayer (SAM) based selective deposition process schemes using cryogenic gas streams are described. Some methods include removing deposits in self-assembled monolayer (SAM) based selective depositions by exposing the substrate to cryogenic aerosols to remove undesired deposition on SAM protected surfaces. Processing chambers for cryogenic gas assisted selective deposition are also described.
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公开(公告)号：US10217650B2
公开(公告)日：2019-02-26
申请号：US15264082
申请日：2016-09-13
Applicant: APPLIED MATERIALS, INC.
Inventor： James Matthew Holden , Song-Moon Suh , Todd Egan , Kalyanjit Ghosh , Leon Volfovski , Michael R. Rice , Richard Giljum
Abstract: A substrate cleaning apparatus may include a substrate support having a support surface to support a substrate to be cleaned, wherein the substrate support is rotatable about a central axis normal to the support surface; a first nozzle to provide a first cleaning gas to a region of the inner volume corresponding to the position of an edge of the substrate when the substrate is supported by the support surface of the substrate support; a first annular body disposed opposite and spaced apart from the support surface of the substrate support by a gap, the first annular body having a central opening defined by an inner wall shaped to provide a reducing size of the gap between the first annular body and the support surface in a radially outward direction; and a first gas inlet to provide a first gas to the central opening of the first annular body.
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公开(公告)号：US20160016286A1
公开(公告)日：2016-01-21
申请号：US14335291
申请日：2014-07-18
Applicant: Applied Materials, Inc.
Inventor： Song-Moon Suh , Yuanhong Guo , Guangchi Xuan , Pulkit Agarwal
Abstract: Disclosed herein are systems and methods for cleaning a ceramic article using a stream of solid carbon dioxide (CO2) particles. A method includes flowing liquid CO2 into a spray nozzle, and directing a first stream of solid CO2 particles from the spray nozzle toward a ceramic article for a first time duration to clean the ceramic article. The liquid CO2 is converted into the first stream of solid CO2 particles upon exiting the spray nozzle. The first stream of solid CO2 particles causes a layer of solid CO2 to be formed on the ceramic article. After the layer of solid CO2 has sublimated, a second stream of solid CO2 particles is directed from the spray nozzle toward the ceramic article for at least one of the first time duration or a second time duration to further clean the ceramic article.
Abstract translation: 本文公开了使用固体二氧化碳（CO 2）颗粒流清洁陶瓷制品的系统和方法。 一种方法包括将液体CO 2流入喷嘴中，并将来自喷嘴的固体CO 2颗粒的第一流引导至陶瓷制品第一时间以清洁陶瓷制品。 液体CO 2在离开喷嘴时被转化为第一流的固体CO 2颗粒。 固体CO 2颗粒的第一流引起在陶瓷制品上形成一层固体CO 2。 在固体CO 2层升华之后，将第二股固体CO 2颗粒流从喷嘴朝着陶瓷制品引导至少第一持续时间或第二持续时间，以进一步清洁陶瓷制品。
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公开(公告)号：US09177782B2
公开(公告)日：2015-11-03
申请号：US13785834
申请日：2013-03-05
Applicant: APPLIED MATERIALS, INC.
Inventor： James Matthew Holden , Song-Moon Suh , Shalina D. Sudheeran , Glen T. Mori
CPC classification number: H01L21/02101 , H01L21/02057 , H01L21/0209 , H01L21/67051
Abstract: A substrate cleaning apparatus may include a substrate support member to support a substrate having a first side and a contaminated second side; a liquid carbon dioxide source; a gaseous carbon dioxide source; and one or more nozzles coupled to the liquid carbon dioxide source and to the gaseous carbon dioxide source, wherein the one or more nozzles are configured to receive liquid carbon dioxide and to discharge a first mixture of solid and gaseous carbon dioxide from the liquid carbon dioxide source to the second side of the substrate and to receive gaseous carbon dioxide and to discharge a second mixture of solid and gaseous carbon dioxide from the gaseous carbon dioxide source to the second side of the substrate. Methods of cleaning a substrate may be performed in the substrate cleaning apparatus.
Abstract translation: 基板清洁装置可以包括用于支撑具有第一侧和受污染的第二侧的基板的基板支撑构件; 液态二氧化碳源; 气态二氧化碳源; 以及耦合到液体二氧化碳源和气态二氧化碳源的一个或多个喷嘴，其中所述一个或多个喷嘴构造成接收液态二氧化碳并且从液态二氧化碳排出固体和气态二氧化碳的第一混合物 源至衬底的第二侧并接收气态二氧化碳，并将固体和气态二氧化碳的第二混合物从气态二氧化碳源排放到衬底的第二侧。 可以在基板清洗装置中进行清洗基板的方法。
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公开(公告)号：US20250093238A1
公开(公告)日：2025-03-20
申请号：US18968156
申请日：2024-12-04
Applicant: Applied Materials, Inc.
Inventor： Changgong Wang , Zhili Zuo , Chang Ke , Song-Moon Suh
Abstract: A processing device of a particle detection system causes a distribution unit of the particle detection system to initiate a particle collection process to dislodge surface particles from a surface of an article based on a stream including solid carbon dioxide (CO2) particles and/or CO2 droplets directed toward the article. A portion of the dislodged surface particles are collected by a particle sampling component that determines, for collected particles and in real-time, a particle number concentration, a particle size, and/or a particle size distribution. A determination is made based on a signal received by the particle sampling component that the at least one of the particle number concentration, the particle size, or the particle size distribution of the portion of the dislodged surface particles satisfies one or more collection criteria. The processing device causes the distribution unit of the particle detection system to terminate the particle collection process.
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