Invention Grant
- Patent Title: Conductive wire through-mold connection apparatus and method
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Application No.: US15777855Application Date: 2015-12-25
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Publication No.: US10756072B2Publication Date: 2020-08-25
- Inventor: Mao Guo
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- International Application: PCT/CN2015/098870 WO 20151225
- International Announcement: WO2017/107176 WO 20170629
- Main IPC: H01L25/10
- IPC: H01L25/10 ; H01L23/31 ; H01L23/498 ; H01L23/538 ; H01L23/00 ; H01L25/00

Abstract:
A microelectronic structure (200) and a fabrication method of microelectronic are described. A first package (10) has a first conductive pad (40, 41, 47, 48) formed on a first foundation layer (12). A loop of conductive wire (50-53) is wirebonded to the first conductive pad ((40, 41, 47, 48) of the first foundation layer (12). A mold cap (70) is formed on the first foundation layer (12). A via (90-93) is formed in the mold cap (70) to reach the conductive wire (50-53). A solder structure (80-83) is coupled to the conductive wire (50-53). A second package (100) is connected to the first package (10) by attaching a second solder structure (110-113) of a second package (100) to the first solder structure (80-83) of the first package (10).
Public/Granted literature
- US20180374832A1 CONDUCTIVE WIRE THROUGH-MOLD CONNECTION APPARATUS AND METHOD Public/Granted day:2018-12-27
Information query
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