- 专利标题: Laser exposure head with reduced leakage
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申请号: US16045864申请日: 2018-07-26
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公开(公告)号: US10761399B2公开(公告)日: 2020-09-01
- 发明人: Valentine A. Karassiouk , Nissim Pilossof
- 申请人: Eastman Kodak Company
- 申请人地址: US NY Rochester
- 专利权人: EASTMAN KODAK COMPANY
- 当前专利权人: EASTMAN KODAK COMPANY
- 当前专利权人地址: US NY Rochester
- 代理商 Kevin E. Spaulding
- 主分类号: G02F1/29
- IPC分类号: G02F1/29 ; G02F1/03 ; G02F1/07 ; G02F1/315 ; B41J2/44 ; G02B5/00 ; G02B27/28
摘要:
A laser exposure system includes an electrically-controlled diffraction grating which can be controlled to be in a first state where the incident light beam is undiffracted and a second state where the incident light beam is diffracted into a plurality of light beams including a zero-order light beam and first and second diffracted light beams. An aperture structure which passes the first and second diffracted light beams while blocking the zero-order light beam. A polarization rotator rotates a polarization state of the second diffracted light, and a polarization beam combiner combines the first diffracted light beam and the polarization-rotated second diffracted light beam onto a common path forming a combined light beam. An optical element focuses the combined light beam onto an imaging medium. A controller controls the state of the electrically-controlled diffraction grating in accordance with pixel data to form a printed image.
公开/授权文献
- US20200033695A1 LASER EXPOSURE HEAD WITH REDUCED LEAKAGE 公开/授权日:2020-01-30
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