Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16522912Application Date: 2019-07-26
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Publication No.: US10763282B2Publication Date: 2020-09-01
- Inventor: Junichi Koezuka , Masami Jintyou , Yukinori Shima , Daisuke Kurosaki , Masataka Nakada , Shunpei Yamazaki
- Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@ce67e49 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@59bcd597 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@61dd0de9 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3be215ed
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/786

Abstract:
A semiconductor device including an oxide semiconductor in which on-state current is high is provided. The semiconductor device includes a first transistor provided in a driver circuit portion and a second transistor provided in a pixel portion; the first transistor and the second transistor have different structures. Furthermore, the first transistor and the second transistor are transistors having a top-gate structure. In an oxide semiconductor film of each of the transistors, an impurity element is contained in regions which do not overlap with a gate electrode. The regions of the oxide semiconductor film which contain the impurity element function as low-resistance regions. Furthermore, the regions of the oxide semiconductor film which contain the impurity element are in contact with a film containing hydrogen. The first transistor provided in the driver circuit portion includes two gate electrodes between which the oxide semiconductor film is provided.
Public/Granted literature
- US20190355764A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-11-21
Information query
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