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公开(公告)号:US12239005B2
公开(公告)日:2025-02-25
申请号:US18417153
申请日:2024-01-19
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Daisuke Kubota , Ryo Hatsumi , Taisuke Kamada , Yuji Iwaki , Junpei Momo , Shunpei Yamazaki
IPC: H10K65/00 , A61B5/00 , A61B5/1172 , A61B5/145 , A61B5/1455 , G06F3/044 , G06V40/12 , G06V40/13 , G09F9/33 , H01L25/18 , H10K30/80 , H10K59/40
Abstract: A display device having a photosensing function is provided. A display device having a biometric authentication function typified by fingerprint authentication is provided. A display device having a touch panel function and a biometric authentication function is provided. The display device includes a first substrate, a light guide plate, a first light-emitting element, a second light-emitting element, and a light-receiving element. The first substrate and the light guide plate are provided to face each other. The first light-emitting element and the light-receiving element are provided between the first substrate and the light guide plate. The first light-emitting element has a function of emitting first light through the light guide plate. The second light-emitting element has a function of emitting second light to a side surface of the light guide plate. The light-receiving element has functions of receiving the first light and converting the first light into an electric signal and functions of receiving the second light and converting the second light into an electric signal. The first light includes visible light, and the second light includes infrared light.
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公开(公告)号:US12237424B2
公开(公告)日:2025-02-25
申请号:US18524033
申请日:2023-11-30
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Shunpei Yamazaki , Hideomi Suzawa
IPC: H01L29/12 , H01L29/04 , H01L29/49 , H01L29/51 , H01L29/786
Abstract: A transistor that is to be provided has such a structure that a source electrode layer and a drain electrode layer between which a channel formation region is sandwiched has regions projecting in a channel length direction at lower end portions, and an insulating layer is provided, in addition to a gate insulating layer, between the source and drain electrode layers and a gate electrode layer. In the transistor, the width of the source and drain electrode layers is smaller than that of an oxide semiconductor layer in the channel width direction, so that an area where the gate electrode layer overlaps with the source and drain electrode layers can be made small. Further, the source and drain electrode layers have regions projecting in the channel length direction at lower end portions.
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公开(公告)号:US12237019B2
公开(公告)日:2025-02-25
申请号:US17772740
申请日:2020-10-16
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei Yamazaki , Takayuki Ikeda , Hitoshi Kunitake
Abstract: A low-power memory device in which a NAND flash memory and a controller are connected to each other with a short wiring, the controller and a cache memory are connected to each other with a short wiring, and signal transmission delay is small is provided. For example, the NAND flash memory is formed using a Si transistor formed with a single crystal silicon substrate. Since an OS transistor can be formed by a method such as a thin-film method, the cache memory formed using the OS memory can be stacked over the NAND flash memory. When the NAND flash memory and the cache memory are formed in one chip, the NAND flash memory and the controller can be connected to each other with a short wiring, and the controller and the cache memory can be connected to each other with a short wiring.
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公开(公告)号:US12230719B2
公开(公告)日:2025-02-18
申请号:US17902010
申请日:2022-09-02
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei Yamazaki , Kenichi Okazaki , Daisuke Kurosaki , Yasutaka Nakazawa
IPC: H01L29/786 , H01L27/12
Abstract: To improve field-effect mobility and reliability of a transistor including an oxide semiconductor film. A semiconductor device includes an oxide semiconductor film, a gate electrode, an insulating film over the gate electrode, the oxide semiconductor film over the insulating film, and a pair of electrodes over the oxide semiconductor film. The oxide semiconductor film includes a first oxide semiconductor film and a second oxide semiconductor film over the first oxide semiconductor film. The first oxide semiconductor film and the second oxide semiconductor film, include the same element. The first oxide semiconductor film includes a region having lower crystallinity than the second oxide semiconductor film.
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公开(公告)号:US12230715B2
公开(公告)日:2025-02-18
申请号:US18600901
申请日:2024-03-11
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Junichi Koezuka , Toshinari Sasaki , Katsuaki Tochibayashi , Shunpei Yamazaki
IPC: H01L29/786 , H01L27/12 , H01L27/146 , H01L29/66 , G02F1/133 , G02F1/1333 , G02F1/1339 , G02F1/1343 , G02F1/1362 , G02F1/1368 , G06F3/041 , H01L27/15 , H10K59/121 , H10K59/124
Abstract: A change in electrical characteristics of a semiconductor device including an interlayer insulating film over a transistor including an oxide semiconductor as a semiconductor film is suppressed. The structure includes a first insulating film which includes a void portion in a step region formed by a source electrode and a drain electrode over the semiconductor film and contains silicon oxide as a component, and a second insulating film containing silicon nitride, which is provided in contact with the first insulating film to cover the void portion in the first insulating film. The structure can prevent the void portion generated in the first insulating film from expanding outward.
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公开(公告)号:US12230172B2
公开(公告)日:2025-02-18
申请号:US18263159
申请日:2022-01-18
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Shunpei Yamazaki , Yosuke Tsukamoto , Koji Kusunoki , Hisao Ikeda , Akio Endo , Yoshiaki Oikawa , Hideki Uochi
IPC: G09G3/00 , G02B27/01 , G06F3/01 , G09G3/3233
Abstract: A semiconductor device having favorable display quality is provided. The semiconductor device is provided with a display portion, a line-of-sight sensor portion, a control portion, and an arithmetic portion. The line-of-sight sensor portion has a function of obtaining first information showing a direction of a user's line of sight. The arithmetic portion has a function of determining a first region including a gaze point of the user on the display portion with use of the first information and a function of increasing a definition of an image displayed on the first region. Light emitted from the display portion may be used to obtain the first information showing the direction of the line of sight.
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公开(公告)号:US12229661B2
公开(公告)日:2025-02-18
申请号:US18510784
申请日:2023-11-16
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Takahiko Ishizu , Takayuki Ikeda , Atsuo Isobe , Atsushi Miyaguchi , Shunpei Yamazaki
IPC: G06N3/065 , G06F1/3234 , G06F7/544 , G06T1/20
Abstract: An arithmetic device and an electronic device having small power consumption is provided. An arithmetic device and an electronic device capable of high-speed operation is provided. An arithmetic device and an electronic device capable of suppressing heat generation is provided. The arithmetic device includes a first arithmetic portion and a second arithmetic portion. The first arithmetic portion includes a first CPU core and a second CPU core. The second arithmetic portion includes a first GPU core and a second GPU core. The CPU cores each have a power gating function and each include a first data retention circuit electrically connected to a flip-flop. The first GPU core includes a second data retention circuit capable of retaining an analog value and reading out the analog value as digital data of two or more bits. The second GPU core includes a third data retention circuit capable of retaining a digital value and reading out the digital value as digital data of one bit. The first to third data retention circuits each include a transistor including an oxide semiconductor and a capacitor.
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公开(公告)号:US12224293B2
公开(公告)日:2025-02-11
申请号:US18399990
申请日:2023-12-29
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Shunpei Yamazaki , Yuichi Sato , Hitoshi Nakayama
Abstract: A semiconductor device including: a first insulator in which an opening is formed; a first conductor positioned in the opening; a first oxide over the first insulator; a second oxide over the first oxide; a third oxide and a fourth oxide over the second oxide; a second conductor over the third oxide and the first conductor; a third conductor over the fourth oxide; a fifth oxide over the second oxide; a second insulator over the fifth oxide; and a fourth conductor positioned over the second insulator and overlapping with the fifth oxide. The fifth oxide is in contact with each of a side surface of the third oxide and a side surface of the fourth oxide. The conductivity of the third oxide is higher than the conductivity of the second oxide. The second conductor is in contact with the top surface of the first conductor.
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公开(公告)号:US12218251B2
公开(公告)日:2025-02-04
申请号:US18626594
申请日:2024-04-04
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Tatsuya Honda , Masashi Tsubuku , Yusuke Nonaka , Takashi Shimazu , Shunpei Yamazaki
IPC: H01L29/786 , G02F1/1333 , G02F1/1337 , G02F1/1339 , G02F1/1343 , H01L27/12 , H01L29/04 , H01L29/24 , H01L29/51 , H01L29/66 , H01L21/02 , H10K59/121
Abstract: A semiconductor device includes a gate electrode, a gate insulating film which includes oxidized material containing silicon and covers the gate electrode, an oxide semiconductor film provided to be in contact with the gate insulating film and overlap with at least the gate electrode, and a source electrode and a drain electrode electrically connected to the oxide semiconductor film. In the oxide semiconductor film, a first region which is provided to be in contact with the gate insulating film and have a thickness less than or equal to 5 nm has a silicon concentration lower than or equal to 1.0 at. %, and a region in the oxide semiconductor film other than the first region has lower silicon concentration than the first region. At least the first region includes a crystal portion.
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公开(公告)号:US12205979B2
公开(公告)日:2025-01-21
申请号:US18236029
申请日:2023-08-21
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Shunpei Yamazaki , Takayuki Ikeda
Abstract: A novel functional panel that is highly convenient or highly reliable is provided. The functional panel includes a first pixel. The first pixel includes a first element, a color conversion layer, and a first functional layer. The first functional layer is positioned between the first element and the color conversion layer. The first element has a function of emitting light and contains gallium nitride. The color conversion layer has a function of converting the color of light emitted from the first element into a different color. The first functional layer includes a first insulating film and a pixel circuit. The first insulating film includes a region positioned between the pixel circuit and the first element, and has an opening. The pixel circuit includes a first transistor. The first transistor includes a first oxide semiconductor film and is electrically connected to the first element through the opening.
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