Invention Grant
- Patent Title: Resistive memory and method for fabricating the same and applications thereof
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Application No.: US16515180Application Date: 2019-07-18
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Publication No.: US10763306B2Publication Date: 2020-09-01
- Inventor: Po-Hao Tseng , Dai-Ying Lee , Erh-Kun Lai
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@576dad73
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L45/00 ; H01L29/417

Abstract:
A resistive memory includes a semiconductor substrate, a dielectric layer, an insulating layer and a metal electrode layer. The semiconductor substrate has a top surface and a recess extending downwards into the semiconductor substrate from the top surface. The dielectric layer is disposed on the semiconductor substrate and has a first through-hole aligning the recess. The insulating layer is disposed in the first through-hole and the recess. The metal electrode layer is disposed on the insulating layer by which the metal electrode layer is isolated from the semiconductor substrate.
Public/Granted literature
- US20190341426A1 RESISTIVE MEMORY AND METHOD FOR FABRICATING THE SAME AND APPLICATIONS THEREOF Public/Granted day:2019-11-07
Information query
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