Invention Grant
- Patent Title: Encoder, position measurement system and lithographic apparatus involving an enclosing device
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Application No.: US15524263Application Date: 2015-10-22
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Publication No.: US10768025B2Publication Date: 2020-09-08
- Inventor: Wouter Onno Pril , Jan Peter Baartman , Allard Eelco Kooiker , Suzanne Johanna Antonetta Geertruda Cosijns , Bryan Tong-Minh
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5c3edf68 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7972fd2e
- International Application: PCT/EP2015/074515 WO 20151022
- International Announcement: WO2016/083039 WO 20160602
- Main IPC: G01D5/38
- IPC: G01D5/38 ; G03F7/20 ; G01B9/02 ; G01B11/02

Abstract:
An encoder includes an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to combine the first and second radiation beams. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to isolate the first path and the second path from the ambient environment.
Public/Granted literature
- US20170343390A1 ENCODER, POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS Public/Granted day:2017-11-30
Information query
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