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公开(公告)号：US12028000B2
公开(公告)日：2024-07-02
申请号：US18132617
申请日：2023-04-10
Applicant: ASML Netherlands B.V.
Inventor： Jan-Gerard Cornelis Van Der Toorn , Jeroen Gertruda Antonius Huinck , Han Willem Hendrik Severt , Allard Eelco Kooiker , Michael Johannes Christiaan Ronde , Arno Maria Wellink , Shibing Liu , Ying Luo , Yixiang Wang , Chia-Yao Chen , Bohang Zhu , Jurgen Van Soest
CPC classification number: H02N13/00 , G03F7/70708 , G03F7/70716
Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
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公开(公告)号：US11637512B2
公开(公告)日：2023-04-25
申请号：US17351181
申请日：2021-06-17
Applicant: ASML Netherlands B.V.
Inventor： Jan-Gerard Cornelis Van Der Toorn , Jeroen Gertruda Antonius Huinck , Han Willem Hendrik Severt , Allard Eelco Kooiker , Michaël Johannes Christiaan Ronde , Arno Maria Wellink , Shibing Liu , Ying Luo , Yixiang Wang , Chia-Yao Chen , Bohang Zhu , Jurgen Van Soest
Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
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公开(公告)号：US11908656B2
公开(公告)日：2024-02-20
申请号：US17497761
申请日：2021-10-08
Applicant: ASML Netherlands B.V.
Inventor： Han Willem Hendrik Severt , Jan-Gerard Cornelis Van Der Toorn , Ronald Van Der Wilk , Allard Eelco Kooiker
CPC classification number: H01J37/20 , H01J37/261 , H01J37/28 , H01J2237/0206 , H01J2237/04756 , H01J2237/24592
Abstract: A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.
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Patent Agency Ranking
公开(公告)号：US11764030B2
公开(公告)日：2023-09-19
申请号：US16714549
申请日：2019-12-13
Applicant: ASML Netherlands B.V.
Inventor： Johannes Hubertus Antonius Van De Rijdt , Peter Paul Hempenius , Allard Eelco Kooiker , Jef Goossens , Petrus Wilhelmus Vleeshouwers
IPC: H01J37/20
CPC classification number: H01J37/20 , H01J2237/2007
Abstract: Disclosed is a stage apparatus comprising: an object support configured to support an object; a positioning device configured to position the object support; a first connection arrangement configured to connect the object support to the positioning device, the first connection arrangement comprising at least one damped connection; and a second connection arrangement configured to connect the object support to the positioning device, the second connection arrangement comprising at least one substantially rigid connection.
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5.发明授权公开(公告)号：US10768025B2
公开(公告)日：2020-09-08
申请号：US15524263
申请日：2015-10-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Wouter Onno Pril , Jan Peter Baartman , Allard Eelco Kooiker , Suzanne Johanna Antonetta Geertruda Cosijns , Bryan Tong-Minh
Abstract: An encoder includes an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to combine the first and second radiation beams. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to isolate the first path and the second path from the ambient environment.
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公开(公告)号：US09971254B2
公开(公告)日：2018-05-15
申请号：US15694519
申请日：2017-09-01
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert-Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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公开(公告)号：US09753382B2
公开(公告)日：2017-09-05
申请号：US14397126
申请日：2013-03-19
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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公开(公告)号：US20150077728A1
公开(公告)日：2015-03-19
申请号：US14397126
申请日：2013-03-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
Abstract translation: 用于浸没式光刻设备的传感器，并且在使用中与浸入液体接触的布置使得从传感器的换能器到温度调节装置的第一热路的热阻小于 从换能器到浸液的第二热流路的热阻。 因此，热流优先朝向温度调节装置，而不是浸没液体，使得浸没液体中的温度引起的干扰减小或最小化。
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