- 专利标题: Mask element precursor and relief image-forming system
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申请号: US15898309申请日: 2018-02-16
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公开(公告)号: US10768520B2公开(公告)日: 2020-09-08
- 发明人: Kevin M. Kidnie , Elsie Anderson Fohrenkamm , M. Zaki Ali
- 申请人: MIRACLON CORPORATION
- 申请人地址: US MN Oakdale
- 专利权人: MIRACLON CORPORATION
- 当前专利权人: MIRACLON CORPORATION
- 当前专利权人地址: US MN Oakdale
- 代理机构: Maschoff Brennan
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03C1/498 ; G03F7/00 ; G03F3/06 ; B41C1/10 ; B41M5/382 ; B41M5/385 ; G03F1/88 ; B41M5/46
摘要:
An imageable material can be used to form a mask element that in turn is useful for providing relief images such as in flexographic printing plates. The imageable material has, in order: (a) a transparent polymeric carrier sheet; (b) a non-ablatable light-to-heat converting having an average dry thickness of 1-5 μm and comprising: (i) an infrared radiation absorbing material at 0.1-5 weight %; (ii) a thermally crosslinked organic polymeric binder material; and (iii) non-thermally ablatable particles having an average particle size of 0.1-20 μm in an amount of 0.2-10 weight %; and (c) a non-silver halide thermally-ablatable imaging layer (IL) disposed on the LTHC layer, the IL comprising a second infrared radiation absorbing material and a UV-light absorbing material dispersed within one or more thermally-ablatable polymeric binder materials.
公开/授权文献
- US20190258152A1 MASK ELEMENT PRECURSOR AND RELIEF IMAGE-FORMING SYSTEM 公开/授权日:2019-08-22
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