Invention Grant
- Patent Title: Seamless ruthenium gap fill
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Application No.: US16159115Application Date: 2018-10-12
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Publication No.: US10790188B2Publication Date: 2020-09-29
- Inventor: Nasrin Kazem , Jeffrey W. Anthis , David Thompson
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C23C16/06
- IPC: C23C16/06 ; H01L21/768 ; C23C16/04 ; C23C16/56 ; H01L21/285
Abstract:
Methods for filling a substrate feature with a seamless ruthenium gap fill are described. The methods include depositing a ruthenium film, oxidizing the ruthenium film to form an oxidized ruthenium film, reducing the oxidized ruthenium film to a reduced ruthenium film and repeating the oxidation and reduction processes to form a seamless ruthenium gap fill.
Public/Granted literature
- US20190115255A1 Seamless Ruthenium Gap Fill Public/Granted day:2019-04-18
Information query
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