Invention Grant
- Patent Title: Methods, apparatus, and system for metal-oxide-semiconductor field-effect transistor (MOSFET) with electrostatic discharge (ESD) protection
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Application No.: US16147303Application Date: 2018-09-28
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Publication No.: US10790276B2Publication Date: 2020-09-29
- Inventor: Chien-Hsin Lee , Manjunatha Prabhu , Mahadeva Iyer Natarajan
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Williams Morgan, P.C.
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/417 ; H01L23/535 ; H01L21/768 ; G05B19/4097

Abstract:
Methods, apparatus, and systems relating to a MOSFET with ESD resistance, specifically, to a semiconductor device comprising a field-effect transistor (FET) comprising a gate, a source, and a drain, all extending parallel to each other in a first direction; at least one source electrostatic discharge (ESD) protection circuit; a source terminal disposed above and in electrical contact with the at least one source ESD protection circuit, wherein the source terminal extends in the first direction; at least one drain ESD protection circuit; and a drain terminal disposed above and in electrical contact with the at least one drain ESD protection circuit, wherein the drain terminal extends in the first direction.
Public/Granted literature
Information query
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