A metalized film includes a dielectric film having a strip-shape, and a metal vapor-deposited electrode. An insulation margin is provided on a first end portion located at one end in a width direction of the dielectric film. A plurality of first slits each extending in a longitudinal direction of the dielectric film and a plurality of fuses are provided close to a second end portion located at an other end in the width direction. The metal vapor-deposited electrode includes a plurality of divided electrodes separated by a corresponding one of a plurality of second slits. Each of the plurality of second slits extends from the insulation margin to a corresponding one of the plurality of first slits. When the metalized film is cut along a cutting line extending in the width direction, at least two divided electrodes among the plurality of divided electrodes are respectively cut at the cutting line.