Invention Grant
- Patent Title: Method for producing a metal-ceramic substrate with at least one via
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Application No.: US15688307Application Date: 2017-08-28
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Publication No.: US10796929B2Publication Date: 2020-10-06
- Inventor: Alexander Roth
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1234199c
- Main IPC: H01L21/48
- IPC: H01L21/48 ; C04B35/645 ; C04B37/02 ; H05K3/40 ; C04B41/00 ; C04B41/51 ; C04B41/88 ; H01L23/15 ; H01L23/373 ; H01L23/498 ; H05K1/03 ; H05K3/02

Abstract:
A method for producing a metal-ceramic substrate with at least one electrically conductive via, in which one metal layer, respectively, is attached in a planar manner to a ceramic plate or a ceramic layer to each of two opposing surface sides of the ceramic layer is provided. The method includes introducing a metal-containing, powdery and/or liquid substance into a hole in the ceramic layer delimiting the via prior to the attachment of both metal layers, or subsequent to the attachment of one of the two metal layers to form an assembly. Prior to the attachment of the other one of the two metal layers, and the assembly is subjected to a high-temperature step above 500° C. in which the metal-containing substance wets the ceramic layer at least partially with a wetting angle of less than 90°.
Public/Granted literature
- US20180061666A1 Method for Producing a Metal-Ceramic Substrate with at Least One Via Public/Granted day:2018-03-01
Information query
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