Invention Grant
- Patent Title: Micro-electro-mechanical systems (MEMS) device and method for fabricating the MEMS
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Application No.: US16223124Application Date: 2018-12-18
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Publication No.: US10798493B2Publication Date: 2020-10-06
- Inventor: Tsung-Min Hsieh , Chien-Hsing Lee , Cheng-Wei Tsai
- Applicant: Solid State System Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Solid State System Co., Ltd.
- Current Assignee: Solid State System Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H04N7/00
- IPC: H04N7/00 ; H04R19/04 ; B81B3/00 ; B81C1/00 ; H04R31/00

Abstract:
A Micro-Electro-Mechanical Systems (MEMS) device includes a substrate, a dielectric supporting layer, a diaphragm, a backplate. The substrate has a substrate opening corresponding to a diaphragm region. The dielectric supporting layer is disposed on the substrate, having a dielectric opening corresponding to the substrate opening to form the diaphragm region. The diaphragm within the dielectric opening is held by the dielectric supporting layer at a periphery. The backplate is disposed on the dielectric supporting layer, having a plurality of venting holes, connecting to the dielectric opening. The backplate includes a conductive layer and a passivation layer covering over the conductive layer at a first side opposite to the diaphragm, wherein a second side of the conductive layer is facing to the diaphragm and not covered by the passivation layer.
Public/Granted literature
- US20190124452A1 MICRO-ELECTRO-MECHANICAL SYSTEMS (MEMS) DEVICE AND METHOD FOR FABRICATING THE MEMS Public/Granted day:2019-04-25
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