Invention Grant
- Patent Title: Magnetic anode for sputter magnetron cathode
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Application No.: US15540325Application Date: 2015-10-26
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Publication No.: US10811236B2Publication Date: 2020-10-20
- Inventor: Phong Ngo , John E. Madocks
- Applicant: General Plasma Inc.
- Applicant Address: US AZ Tucson
- Assignee: General Plasma, Inc.
- Current Assignee: General Plasma, Inc.
- Current Assignee Address: US AZ Tucson
- Agency: Grossman Tucker Perreault & Pfleger, PLLC
- International Application: PCT/US2015/057407 WO 20151026
- International Announcement: WO2016/069490 WO 20160506
- Main IPC: H01J37/34
- IPC: H01J37/34

Abstract:
A rotary sputter magnetron assembly for use in sputtering target material onto a substrate is provided. The assembly comprises a longitudinally extending target tube having a longitudinal central axis, said target tube extending about a magnet array that is configured to generate a plasma confining magnetic field adjacent the target tube, said target tube supported for rotation about its longitudinal central axis and a pair of side shunts positioned parallel to the longitudinal central axis, and on opposing lengthwise sides of said target tube.
Public/Granted literature
- US20170345628A1 MAGNETIC ANODE FOR SPUTTER MAGNETRON CATHODE Public/Granted day:2017-11-30
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