公开(公告)号：US10273570B2

公开(公告)日：2019-04-30

申请号：US15180289

申请日：2016-06-13

Applicant: General Plasma Inc.

Inventor： John E. Madocks ,  Patrick Lawrence Morse ,  Phong Ngo

IPC: C23C14/54 ,  C23C14/34 ,  C23C14/35 ,  H01J37/34

Abstract: An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.

公开(公告)号：US10811236B2

公开(公告)日：2020-10-20

申请号：US15540325

申请日：2015-10-26

Applicant: General Plasma Inc.

Inventor： Phong Ngo ,  John E. Madocks

IPC: H01J37/34

Abstract: A rotary sputter magnetron assembly for use in sputtering target material onto a substrate is provided. The assembly comprises a longitudinally extending target tube having a longitudinal central axis, said target tube extending about a magnet array that is configured to generate a plasma confining magnetic field adjacent the target tube, said target tube supported for rotation about its longitudinal central axis and a pair of side shunts positioned parallel to the longitudinal central axis, and on opposing lengthwise sides of said target tube.

公开(公告)号：US20150299470A1

公开(公告)日：2015-10-22

申请号：US14699963

申请日：2015-04-29

Applicant: General Plasma, Inc.

Inventor： Phong Ngo ,  John Madocks

IPC: C09D5/00 ,  G06F1/16 ,  G06F3/041

CPC classification number: C09D5/006 ,  G02B1/118 ,  G02B27/0006 ,  G06F1/1643 ,  G06F3/0412 ,  G06F2203/04107

Abstract: A scratch-resistant anti-reflective film in accordance with a particular embodiment includes an anti-reflective stack and a protective layer overlying the anti-reflective stack. The anti-reflective stack has at least six stack layers of alternating higher and lower refractive indexes. The protective layer is at least primarily composed of diamond-like carbon and has a thickness of not more than 5 nm. At least a 15 cm2 region of the film is continuous and has an average nanoindentation hardness of at least 8 GPa using the Continuous Stiffness Measurement Technique. An average reflectance off the film at the region from normal incident light of wavelengths from 425 nm to 675 nm is not more than 1%. Average a* and b* in CIELAB color space for reflectance off the film at the region from −45° to 45° incident visible light are within a range from −2.0 to 2.0.

Abstract translation: 根据特定实施例的耐刮擦抗反射膜包括抗反射叠层和覆盖防反射叠层的保护层。 抗反射叠层具有至少六个交叠的较高和较低折射率的堆叠层。 保护层至少主要由类金刚石碳组成，厚度不大于5nm。 使用连续刚度测量技术，膜的至少15cm 2区域是连续的并且具有至少8GPa的平均纳米压痕硬度。 在从425nm到675nm的波长的正常入射光的区域处的膜的平均反射率不大于1％。 CIELAB颜色空间中的平均值a *和b *在-45°至45°的区域内的入射可见光的反射率在-2.0至2.0的范围内。