公开(公告)号：US10811236B2

公开(公告)日：2020-10-20

申请号：US15540325

申请日：2015-10-26

Applicant: General Plasma Inc.

Inventor： Phong Ngo ,  John E. Madocks

IPC: H01J37/34

Abstract: A rotary sputter magnetron assembly for use in sputtering target material onto a substrate is provided. The assembly comprises a longitudinally extending target tube having a longitudinal central axis, said target tube extending about a magnet array that is configured to generate a plasma confining magnetic field adjacent the target tube, said target tube supported for rotation about its longitudinal central axis and a pair of side shunts positioned parallel to the longitudinal central axis, and on opposing lengthwise sides of said target tube.

公开(公告)号：US20150235821A1

公开(公告)日：2015-08-20

申请号：US14429667

申请日：2013-09-19

Applicant: GENERAL PLASMA, INC.

Inventor： John E. Madocks ,  Ryan Lohrenz ,  Steven Smith, SR.

IPC: H01J37/34 ,  B25B5/14 ,  F16B2/08

CPC classification number: H01J37/3435 ,  B25B5/147 ,  F16B2/08 ,  H01J37/3455 ,  Y10T29/49947

Abstract: A clamp is provided that incorporates a plurality of flexible links with V flexures between the links to maintain even spacing of the links before and during installation. Each link has multiple segments joined around at least one flexure point, and a floating band surrounding the links to distribute clamping pressure that is produced along a circumference of contact points. The clamp provides evenly distributed clamping pressure by increasing the number of clamping contact points between the clamp and articles being joined. The clamp has non-limiting applications for clamping target tubes or as a vacuum flange for ISO fittings. A clamp can produce a vacuum tight seal between a target tube and end block or end support flange of a rotary magnetron without resort to tools, and as such is rapidly secured in place.

Abstract translation: 提供一种夹具，其在链节之间结合有多个具有V形弯曲的柔性连接件，以在安装之前和安装期间保持连杆的均匀间距。 每个连杆具有围绕至少一个挠曲点连接的多个段，以及围绕该链节的浮动带，以分布沿着接触点的圆周产生的夹紧压力。 夹具通过增加夹具和待连接物品之间的夹紧接触点的数量来提供均匀分布的夹紧压力。 夹具具有用于夹紧目标管或ISO配件的真空法兰的非限制性应用。 夹具可以在目标管和旋转磁控管的端部支撑凸缘之间产生真空密封，而不需要使用工具，并且因此快速固定就位。

公开(公告)号：US10989343B2

公开(公告)日：2021-04-27

申请号：US15568295

申请日：2016-04-25

Applicant: General Plasma, Inc.

Inventor： John E. Madocks

IPC: F16L37/23

Abstract: A quick coupling for connecting fluid lines with one-handed push-to-connect and pull-to-disconnect operation is described. The quick coupling achieves this preferred functionality with a minimum number parts, the quick coupling having only one spring and one dynamic seal. In addition to fluid carrying applications the quick coupling can be used for tool holding and power transmission.

公开(公告)号：US20160148775A1

公开(公告)日：2016-05-26

申请号：US14897232

申请日：2014-06-12

Applicant: GENERAL PLASMA, INC.

Inventor： John E. Madocks

IPC: H01J27/14

CPC classification number: H01J27/14 ,  H01J27/024 ,  H01J27/10 ,  H01J37/08

Abstract: A linear anode layer ion source is provided that includes a top pole having a linear ion emitting slit. An anode under the top pole has a slit aligned with the top pole ion emitting slit. At least one magnet creates a magnetic field that passes through the anode slit. Wherein the width of the anode slit is 3 mm or less. A process of generating an accelerated ion beam is also provided that includes flowing a gas into proximity to said anode. By energizing a power supply electron flow is induced to the anode and the gas is ionized. Accelerating the ions from the anode through the linear ion emitting slit generates an accelerated ion beam by a process superior to that using a racetrack-shaped slit.

Abstract translation: 提供线性阳极层离子源，其包括具有线性离子发射狭缝的顶极。 顶极下的阳极具有与顶极离子发射狭缝对准的狭缝。 至少一个磁体产生通过阳极狭缝的磁场。 其中阳极狭缝的宽度为3mm以下。 还提供了产生加速离子束的过程，其包括使气体流动到所述阳极附近。 通过激励电源，电子流引入阳极并且气体被电离。 通过线性离子发射狭缝加速来自阳极的离子通过比使用跑道形狭缝的方法更高的加工离子束产生加速离子束。

公开(公告)号：US20160027608A1

公开(公告)日：2016-01-28

申请号：US14754381

申请日：2015-06-29

Applicant: General Plasma, Inc.

Inventor： John Madocks

IPC: H01J37/08 ,  H01J37/34

CPC classification number: H01J37/08 ,  H01J27/143 ,  H01J37/3053 ,  H01J37/317 ,  H01J37/32862 ,  H01J37/3405 ,  H01J2237/081

Abstract: A process for modifying a surface of a substrate is provided that includes supplying electrons to an electrically isolated anode electrode of a closed drift ion source. The anode electrode has an anode electrode charge bias that is positive while other components of the closed drift ion source are electrically grounded or support an electrical float voltage. The electrons encounter a closed drift magnetic field that induces ion formation. Anode contamination is prevented by switching the electrode charge bias to negative in the presence of a gas, a plasma is generated proximal to the anode electrode to clean deposited contaminants from the anode electrode. The electrode charge bias is then returned to positive in the presence of a repeat electron source to induce repeat ion formation to again modify the surface of the substrate. An apparatus for modification of a surface of a substrate by this process is provided.

Abstract translation: 提供了一种用于修改衬底表面的方法，其包括向闭合漂移离子源的电隔离的阳极提供电子。 阳极电极具有正极的阳极电极偏压，而闭合漂移离子源的其它部件电接地或支持电浮动电压。 电子遇到诱发离子形成的闭合漂移磁场。 通过在存在气体的情况下将电极充电偏压切换为负来防止阳极污染，在阳极电极附近产生等离子体以清除来自阳极电极的沉积的污染物。 然后在存在重复电子源的情况下将电极充电偏压返回到正值，以引起重复的离子形成，以再次改变衬底的表面。 提供了一种通过该方法修改基板的表面的装置。

公开(公告)号：US20170345628A1

公开(公告)日：2017-11-30

申请号：US15540325

申请日：2015-10-26

Applicant: General Plasma Inc.

Inventor： Phong NGO ,  John E. Madocks

IPC: H01J37/34

CPC classification number: H01J37/3423 ,  H01J37/3405 ,  H01J37/3438 ,  H01J37/345 ,  H01J37/3452

Abstract: A rotary sputter magnetron assembly for use in sputtering target material onto a substrate is provided. The assembly comprises a longitudinally extending target tube having a longitudinal central axis, said target tube extending about a magnet array that is configured to generate a plasma confining magnetic field adjacent the target tube, said target tube supported for rotation about its longitudinal central axis and a pair of side shunts positioned parallel to the longitudinal central axis, and on opposing lengthwise sides of said target tube.

公开(公告)号：US20210333438A1

公开(公告)日：2021-10-28

申请号：US16614165

申请日：2018-05-22

Applicant: General Plasma Inc.

Inventor： Phong NGO

IPC: G02B1/118 ,  G02B5/28

Abstract: Multilayer antireflective articles are disclosed. In embodiments, the multilayer antireflective articles include a combination of a moth-eye layer and a multi-layer antireflective stack. The articles can exhibit desirable optical properties for use in various applications, including screen overlays. Methods of forming such articles are also disclosed.

公开(公告)号：US10273570B2

公开(公告)日：2019-04-30

申请号：US15180289

申请日：2016-06-13

Applicant: General Plasma Inc.

Inventor： John E. Madocks ,  Patrick Lawrence Morse ,  Phong Ngo

IPC: C23C14/54 ,  C23C14/34 ,  C23C14/35 ,  H01J37/34

Abstract: An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.

公开(公告)号：US10134557B2

公开(公告)日：2018-11-20

申请号：US14897232

申请日：2014-06-12

Applicant: General Plasma, Inc.

Inventor： John E. Madocks

IPC: H01J27/14 ,  H01J27/10 ,  H01J27/02 ,  H01J37/08

Abstract: A linear anode layer ion source is provided that includes a top pole having a linear ion emitting slit. An anode under the top pole has a slit aligned with the top pole ion emitting slit. At least one magnet creates a magnetic field that passes through the anode slit. Wherein the width of the anode slit is 3 mm or less. A process of generating an accelerated ion beam is also provided that includes flowing a gas into proximity to said anode. By energizing a power supply electron flow is induced to the anode and the gas is ionized. Accelerating the ions from the anode through the linear ion emitting slit generates an accelerated ion beam by a process superior to that using a racetrack-shaped slit.

公开(公告)号：US20180142791A1

公开(公告)日：2018-05-24

申请号：US15568223

申请日：2016-04-22

Applicant: John E. Madocks ,  General Plasma, Inc.

Inventor： John E. MADOCKS

IPC: F16K3/06 ,  F16K51/02 ,  F16K3/02 ,  F16K3/10

CPC classification number: F16K3/06 ,  F16K3/0218 ,  F16K3/0254 ,  F16K3/10 ,  F16K3/182 ,  F16K51/02

Abstract: A chamber valve (100) for use in processes requiring vacuum pressures has a compact design which minimizes the space needed for the valve in the travel direction. The chamber valve gate (116) is moveable between a first position in which the gate is offset from the portal (110), and a second position in which the gate is aligned with the portal. The gate will move into alignment with the portal while remaining within a plane parallel or nearly parallel to the portal.